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Laser-induced etching and deposition of W using a-SiO2 microspheres

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Abstract.

A regular lattice of a-SiO2 microspheres on a quartz support is used as a microlens array for laser-induced surface patterning by etching and deposition of W in atmospheres of WF6 and WF6+H2, respectively.

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Authors and Affiliations

  1. Angewandte Physik, Johannes-Kepler-Universität, Altenbergerstrasse 69, 4040 Linz, Austria, , , , , , AT

    R. Denk, K. Piglmayer & D. Bäuerle

Authors
  1. R. Denk
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  2. K. Piglmayer
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  3. D. Bäuerle
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Additional information

Received: 22 July 2002 / Accepted: 30 July 2002 / Published online: 4 December 2002

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ID="*"Corresponding author. Fax: +43-732/2468-9242, Email: dieter.baeuerle@jku.at

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Denk, R., Piglmayer, K. & Bäuerle, D. Laser-induced etching and deposition of W using a-SiO2 microspheres . Appl Phys A 76, 549–550 (2003). https://doi.org/10.1007/s00339-002-1892-8

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  • DOI: https://doi.org/10.1007/s00339-002-1892-8

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