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Electrochemical and dielectric behavior in poly(vinyl alcohol)/poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) blend for energy storage applications

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Abstract

Herein, dielectric studies of solvent-cast poly(vinyl alcohol) (PVA) with poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) (PEDOT:PSS) freestanding films are conducted in the frequency range of 100 Hz–1 MHz and temperature ranging from 303 to 453 K. An insulator to semiconducting transition is observed for PVA/PEDOT:PSS blend above 413 K. Existence of two types of conduction mechanism, hopping between nearest neighbor at low-temperature region (303–383 K) and free-band conduction at high temperatures (above 413 K) within PVA/PEDOT:PSS films under the influence of applied field, is observed and supported by electric moduli formalisms. An increase in dielectric constant and a significant reduction in \(\tan \delta\) values are observed under high temperature and low frequency with the addition of PEDOT:PSS. Greater than 100% Coulombic efficiency and 82% specific capacitance retention at 5000 cycles are observed for 7.5 vol% PEDOT:PSS in PVA working electrode for supercapacitor. Thus, the fabricated films find potential applications in the field of flexible conventional capacitors and as working electrodes for supercapacitor.

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Acknowledgements

The authors express their gratitude to Dr. N. V. Giridharan, Dr. M. C. Santhoshkumar and Dr. M. Ashok at Department of Physics, National Institute of Technology, Tiruchirappalli, for extending the dielectric testing, thickness measurement and FT-IR facilities, respectively.

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  1. Carbon Nanomaterials Laboratory, Department of Physics, National Institute of Technology, Tiruchirappalli, 620 015, India

    V. Mydhili & S. Manivannan

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  1. V. Mydhili
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Correspondence to S. Manivannan.

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Mydhili, V., Manivannan, S. Electrochemical and dielectric behavior in poly(vinyl alcohol)/poly(3,4-ethylenedioxythiophene):poly(styrenesulfonate) blend for energy storage applications. Polym. Bull. 76, 4735–4752 (2019). https://doi.org/10.1007/s00289-018-2630-5

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  • DOI: https://doi.org/10.1007/s00289-018-2630-5

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