Summary
Functionalization of both linear poly(4-hydroxystyrene) (PHS) and branched poly(4-hydroxystyrene) (PHS-B) was accomplished via a Reimer-Tiemann electrophilic aromatic substitution reaction. Linear and branched poly(4-hydroxystyrene-co-5-vinylsalicylaldehyde) (pHS/5VSA and pHS-B/5VSA) copolymers were observed to undergo acid-catalyzed, novolac type self-crosslinking. Both the pHS/5VSA and pHS-B/5VSA copolymer systems possessed a lower deep ultra violet microlithographic sensitivity compared to linear PHS when formulated in negative photoresists. The sluggishness of the negative photoresists containing 5-vinylsalicylaldehyde functionalized copolymers was attributed to a combination of resonance stabilization and steric hindrance effects.
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Aronson, C., Beloskur, D., Frampton, I. et al. Electrophilic Aromatic Functionalization of Phenolic Photoresist Polymers. Polym. Bull. 52, 409–419 (2004). https://doi.org/10.1007/s00289-004-0305-x
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DOI: https://doi.org/10.1007/s00289-004-0305-x