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Application of thermal convection to stability analysis of lithograph

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Abstract

Thermal conduction and thermal convection are two major cooling methods. The experiment applies these two methods simultaneously to cool photo-masks. The combination of thermal conduction and thermal convection can solve the problems of thermal expansion of masks during long-term exposure. Highly thermal conductive material can conduct heat that accumulates on chromium to the diamond film. However, heat that is conducted on the diamond film is not easily discharged into the air. Therefore, a thermal convection method to cool a diamond film is designed. The method involves blowing N 2 gas at 23°C onto the surface of masks.

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Authors and Affiliations

  1. Chemical Systems Research Division, Chung-Shan Institute of Science and Technology, Longtan Township, Taoyuan County, Taiwan

    Yang-Kuao Kuo

  2. No.154, Singuo St., Jhu-bei city, Hsin-Chu, Taiwan, ROC

    Yang-Kuao Kuo

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  1. Yang-Kuao Kuo
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Correspondence to Yang-Kuao Kuo.

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Kuo, YK. Application of thermal convection to stability analysis of lithograph. Heat Mass Transfer 47, 1395–1399 (2011). https://doi.org/10.1007/s00231-011-0798-4

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  • DOI: https://doi.org/10.1007/s00231-011-0798-4

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