Abstract
The direct determination of trace impurities in Al2O3 ceramic basic powders by ICP–MS using electrothermal evaporation (ETV) with slurry sampling has been investigated. To increase interference-free analyte volatilization, the use of the palladium-group modifiers (PGM) IrCl3, Pd(NO3)2, and PdCl2 for the determination of Ca, Fe, Ga, Mg, Mn, Na, Ni, and V in Al2O3 powders was studied. Their role, which in ETV–ICP–MS and ETV– ICP–OES is to stabilize the investigated analyte during the ashing phase, to increase vaporization of the matrix, and to reduce transport losses was investigated.
Optimum analysis results were obtained with PdCl2 modifier when 500 ng Pd was used for a sample weight of 100 μg Al2O3 injected into the ETV. Calibration was performed by standard addition with aqueous solutions of the analytes. The RSDs calculated from triplicate analysis ranged form 5 to 10%. Detection limits between 0.07 μg g–1 (Ga) and 1.1 μg g–1 (Na) were achieved. The accuracy was proven for the elements Ca, Fe, Ga, Mg, Mn, Na, Ni, and V by analyzing an NIST standard reference Al2O3 material (SRM 699) with a middle grain size of 16.4 μm. The analytical method was used for the analysis of Al2O3 powder (AKP 30, Sumitomo, Japan) with impurities in the low μg g–1 range and a middle grain size of 1.1 μm. The results obtained for the elements Ca, Fe, Ga, Mg, Mn, Na, Ni, and V were comparable with those obtained by ICP–MS subsequent to conventional decomposition with hydrochloric acid at high pressure.
Similar content being viewed by others
Author information
Authors and Affiliations
Additional information
Received: 16 November 2000 / Revised: 8 February 2001 / Accepted: 10 February 2001
Rights and permissions
About this article
Cite this article
Wende, M., Broekaert, J. Investigations on the use of chemical modifiers for the direct determination of trace impurities in Al2O3 ceramic powders by slurry electrothermal evaporation coupled with inductively-coupled plasma mass spectrometry (ETV–ICP–MS). Fresenius J Anal Chem 370, 513–520 (2001). https://doi.org/10.1007/s002160100783
Published:
Issue Date:
DOI: https://doi.org/10.1007/s002160100783