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Cluster magnetorheological global dynamic pressure planarization processing of single crystal sapphire

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Abstract

The ultra-smooth planarization processing of single crystal sapphire is the basis for the realization of high-performance optoelectronic/micro-electronic devices, and its extremely high hardness and stability bring great challenges to the high-efficiency and high-quality planarization. A cluster magnetorheological global dynamic pressure polishing method was proposed by combining the collective constrained polishing disk of a 3-D microstructure with the reciprocating variable gap between tool and workpiece. Four types of magnetorheological polishing methods were used for comparative experimental study, and a single-factor experiment was conducted on process parameters such as the hole diameter and hole gap in the collective constrained polishing disk and variable gap frequency and amplitude of the workpiece. The results show that the flow field characteristics and the structure degree of the carbonyl iron powders in the processing area can be controlled by the collective constrained polishing disk and the reciprocating variable gap motion of the workpiece. The polishing force of the polishing pad on the workpiece surface is increased. Meanwhile, the extrusion scratch removal of abrasive particles and the stretching reflow update can be realized. Compared with traditional magnetorheological polishing, the material removal rate is increased by 154.6%, and the surface roughness is reduced by 67.1%. The average surface roughness of single crystal sapphire decreases from Ra 5.61 to Ra 0.33 nm within an area of 120 μm × 96 μm after 5-h polishing using the optimized process. The global dynamic pressure formed by the collective constrained polishing disk and the reciprocating variable gap of the workpiece can control the force exerted by the polishing pad on the workpiece surface and improve the polishing efficiency and surface quality.

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References

  1. Dong Y, Lei H, Liu WQ, Wang TX, Xu L (2018) Preparation of non-spherical silica composite abrasives by lanthanum ion-induced effect and its chemical–mechanical polishing properties on sapphire substrates. J Mater Sci 53:10732–10742. https://doi.org/10.1007/s10853-018-2357-6

    Article  Google Scholar 

  2. Zhang ZF, Liu WL, Song ZT, Hu XK (2010) Two-step chemical mechanical polishing of sapphire substrate. J Electrochem Soc 157:H688. https://doi.org/10.1149/1.3410116

    Article  Google Scholar 

  3. Wen D (2009) Effect of plate materials on sapphire wafer lapping process. Chin J Mech Eng 45:247–250. https://doi.org/10.3901/jme.2009.02.247

    Article  Google Scholar 

  4. Liu DD, Zhang ZY, Feng JJ, Yu ZB, Meng FN, Xu GH, Wang JM, Wen W, Liu W (2022) Atomic-level flatness on oxygen-free copper surface in lapping and chemical mechanical polishing. Nanoscale Adv 4:4263–4271. https://doi.org/10.1039/D2NA00405D

    Article  Google Scholar 

  5. Park C, Kim H, Lee S, Jeong H (2015) The influence of abrasive size on high-pressure chemical mechanical polishing of sapphire wafer. Int J Precis Eng Manuf-Green Technol 2:157–162. https://doi.org/10.1007/s40684-015-0020-0

    Article  Google Scholar 

  6. Wang X, Lei H, Chen RL (2017) CMP behavior of alumina/metatitanic acid core–shell abrasives on sapphire substrates. Precis Eng 50:263–268. https://doi.org/10.1016/j.precisioneng.2017.05.013

    Article  Google Scholar 

  7. Xu YC, Lu J, Xu XP (2016) Study on planarization machining of sapphire wafer with soft-hard mixed abrasive through mechanical chemical polishing. Appl Surf Sci 389:713–720. https://doi.org/10.1016/j.apsusc.2016.07.155

    Article  Google Scholar 

  8. Zhang ZY, Liu J, Hu W, Zhang LZ, Xie WX, Liao LX (2021) Chemical mechanical polishing for sapphire wafers using a developed slurry. J Manuf Process 62:762–771. https://doi.org/10.1016/j.jmapro.2021.01.004

    Article  Google Scholar 

  9. Zhang ZY, Shi ZF, Du YF, Yu ZJ, Guo LC, Guo DM (2018) A novel approach of chemical mechanical polishing for a titanium alloy using an environment-friendly slurry. Appl Surf Sci 427:409–415. https://doi.org/10.1016/j.apsusc.2017.08.064

    Article  Google Scholar 

  10. Xie WX, Zhang ZY, Liao LX, Liu J, Su HJ, Wang SD, Guo DM (2020) Green chemical mechanical polishing of sapphire wafers using a novel slurry. Nanoscale 12:22518–22526. https://doi.org/10.1039/D0NR04705H

    Article  Google Scholar 

  11. Tsai MY, Yang WZ (2012) Combined ultrasonic vibration and chemical mechanical polishing of copper substrates. Int J Mach Tools Manuf 53:69–76. https://doi.org/10.1016/j.ijmachtools.2011.09.009

    Article  Google Scholar 

  12. Ohanessian K, Monnot M, Moulin P, Ferrasse JH, Barca C, Soric A, Boutin O (2020) Dead-end and crossflow ultrafiltration process modelling: application on chemical mechanical polishing wastewaters. Chem Eng Res Des 158:164–176. https://doi.org/10.1016/j.cherd.2020.04.007

    Article  Google Scholar 

  13. Bedi TS, Kant R (2021) Comparative performance of magnetorheological external finishing tools using different magnetic structures. Mater Today: Proc 41:908–914. https://doi.org/10.1016/j.matpr.2020.09.485

    Article  Google Scholar 

  14. Jiao L, Wu Y, Wang X, Guo H, Liang Z (2013) Fundamental performance of magnetic compound fluid (MCF) wheel in ultra-fine surface finishing of optical glass. Int J Mach Tools Manuf 75:109–118. https://doi.org/10.1016/j.ijmachtools.2013.09.003

    Article  Google Scholar 

  15. Wang YY, Zhang Y, Feng ZJ (2016) Analyzing and improving surface texture by dual-rotation magnetorheological finishing. Appl Surf Sci 360:224–233. https://doi.org/10.1016/j.apsusc.2015.11.009

    Article  Google Scholar 

  16. Song WL, Li HL, Ma JT, Hu ZC, Shi P (2018) Experimental investigation of the magnetorheological polishing process with roller. Ind Lubr Tribol 70:1060–1065. https://doi.org/10.1108/ILT-12-2017-0367

    Article  Google Scholar 

  17. Peng WQ, Guan CL, Li SY (2013) Ultrasmooth surface polishing based on the hydrodynamic effect. Appl Opt 52:6411–6416. https://doi.org/10.1364/AO.52.006411

    Article  Google Scholar 

  18. Guo YF, Yin SH, Ohmori H, Li M, Chen FJ, Huang S (2022) A novel high efficiency magnetorheological polishing process excited by Halbach array magnetic field. Precis Eng 74:175–185. https://doi.org/10.1016/j.precisioneng.2021.11.011

    Article  Google Scholar 

  19. Luo B, Yan QS, Chai JF, Song WQ, Pan JS (2022) Theoretical and experimental research into a novel method of cluster magnetorheological finishing based on a circular array polishing disk. Int J Adv Manuf Technol 121:6535–6550. https://doi.org/10.1007/s00170-022-09751-7

    Article  Google Scholar 

  20. Luo B, Yan QS, Huang ZL, Pan JS, Fu YZ (2021) Machining method for controlling the behaviours of Bingham fluids in cluster magnetorheological polishing pads. Smart Mater Struct 30:25002. https://doi.org/10.1088/1361-665X/abcd6d

    Article  Google Scholar 

  21. Luo B, Yan QS, Chai JF, Song WQ, Pan JS (2022) An ultra-smooth planarization method for controlling fluid behavior in cluster magnetorheological finishing based on computational fluid dynamics. Precis Eng 74:358–368. https://doi.org/10.1016/j.precisioneng.2022.01.001

    Article  Google Scholar 

  22. Liu ZY, Li F, Li XW, Xu J (2021) Characteristic analysis and squeezing force mathematical model for magnetorheological fluid in squeeze mode. J Magn Magn Mater 529:167736. https://doi.org/10.1016/j.jmmm.2021.167736

    Article  Google Scholar 

  23. Mohamad N, Mazlan SA, Ubaidillah CS, Imaduddin F, Abdul Aziz SA (2019) The field-dependent viscoelastic and transient responses of plate-like carbonyl iron particle based magnetorheological greases. J Intell Mater Syst Struct 30:788–797. https://doi.org/10.1177/1045389X19828504

    Article  Google Scholar 

  24. Chen KK, Tian Y, Shan L, Zhang XJ, Meng YG (2014) Squeeze behaviors of magnetic powders between two parallel plates. Smart Mater Struct 23:117004. https://doi.org/10.1088/0964-1726/23/11/117004

    Article  Google Scholar 

  25. Yan QS, Liao BT, Lu JB, Fu YZ (2021) Experimental study on cluster magnetorheological variable gap dynamic pressure planarization finishing. J Mech Eng 57:230. https://doi.org/10.3901/JME.2021.19.021

    Article  Google Scholar 

  26. Luo B, Yan QS, Pan JS, Lu JB, Fu YZ (2022) Simulation and experimental research on magnetorheological finishing under dynamic pressure with a gap-varying. J Manuf Process 82:265–276. https://doi.org/10.1016/j.jmapro.2022.07.058

    Article  Google Scholar 

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Funding

This work was supported by the Jiangxi Provincial Natural Science Foundation (No. 20224BAB214054), grant recipient: Bin Luo; the Science and Technology Research Project of Jiangxi Provincial Education Department (No. GJJ2201116), grant recipient: Bin Luo; the Doctoral Research Start-up Foundation of Nanchang Hangkong University (No. EC202203056), grant recipient: Bin Luo; and the National Natural Science Foundation of China (No. U1801259), grant recipient: Qiusheng Yan.

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Authors and Affiliations

  1. School of Aeronautical Manufacturing Engineering, Nanchang Hangkong University, Nanchang, 330000, China

    Bin Luo, Yuwei Li, Jingfu Chai & Wenqing Song

  2. School of Electromechanical Engineering, Guangdong University of Technology, Guangzhou, 510006, China

    Qiusheng Yan

  3. Education and Training Division, Chinese Mechanical Engineering Society, 100084, Beijing, China

    Xi Lan

Authors
  1. Bin Luo
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  2. Yuwei Li
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  3. Qiusheng Yan
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  4. Jingfu Chai
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  5. Wenqing Song
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  6. Xi Lan
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Contributions

Bin Luo: investigation, writing—original draft preparation, writing—reviewing and editing

Yuwei Li: writing—original draft preparation, software, investigation

Qiusheng Yan: funding acquisition, methodology, validation

Jingfu Chai: conceptualization, data curation

Wenqing Song: visualization, data curation

Xi Lan: writing—reviewing and editing, formal analysis

Corresponding authors

Correspondence to Bin Luo or Xi Lan.

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Luo, B., Li, Y., Yan, Q. et al. Cluster magnetorheological global dynamic pressure planarization processing of single crystal sapphire. Int J Adv Manuf Technol 128, 1213–1228 (2023). https://doi.org/10.1007/s00170-023-11960-7

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  • DOI: https://doi.org/10.1007/s00170-023-11960-7

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