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A review: development of the maskless localized electrochemical deposition technology

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Abstract

Presented in 1996, maskless localized electrochemical deposition (LECD) is an emerging and unconventional manufacturing technology that originated from precision electroforming and electroplating. As a novel additive manufacturing technology, it forms a three-dimensional structure layer by layer at atomic scale. In this work, we present a review of the theoretical basis and key parameters of maskless LECD technology. LECD process, almost limited to linear structure-based depositions, is capable of creating structures with high aspect ratio up to 280. However, the degree of deposition accuracy is not satisfactory during the whole process. Besides, the deposition rate is rather slow and the highest deposition rate of 25 μm/s was reported in published literature. Moreover, not all metals can be deposited due to the limitations of the electrochemical discipline. For instance, the effects of interelectrode potential difference, interelectrode gap, scanning speed, electrolyte concentration, and energy field on the quality of maskless LECD were discussed. Although all parameters abovementioned have an effect on the deposition results, there is currently no optimization software that can calculate the optimal values in an effective manner. By combining different deposition structures, special tiny part systems can be generated or integrated into devices for tackling current and future challenges in some fields such as electronic circuits, microfluidics, communications, and biomedical aspect. Additionally, this work also introduces main hybrid variants of LECD. Possible future efforts to fully exploit LECD potential are also discussed.

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Acknowledgments

This review includes numerous science research literature in electrochemical deposition and additive manufacturing filed. Here, we must express our heartfelt thanks to all the researchers.

Funding

This work was supported by National Key Research and Development Program (No. 2018YFB1107403); The Fund for Equipment Pre-Research (No. 61409230312); China-EU H2020 International Science and Technology Cooperation Programme (FabSurfWAR Nos. 2016YFE0112100 and 644971); Jilin Province Science and Technology Development Program (Nos. 20180201057GX and Z20190101005JH); and the “111” Project of China (No. D17017).

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  1. Ministry of Education Key Laboratory for Cross-Scale Micro and Nano Manufacturing, Changchun University of Science and Technology, Changchun, 130022, China

    Jinkai Xu, Wanfei Ren, Zhongxu Lian, Peng Yu & Huadong Yu

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Xu, J., Ren, W., Lian, Z. et al. A review: development of the maskless localized electrochemical deposition technology. Int J Adv Manuf Technol 110, 1731–1757 (2020). https://doi.org/10.1007/s00170-020-05799-5

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