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Microscopic characterization and modeling of oxide layer for electrolytic in-process dressing (ELID) grinding with focus on voltage, electrode-wheel gap, and coolant flow

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Abstract

Electrolytic in-process dressing (ELID) is a grinding technique used to generate high-quality surfaces on hard and brittle material. Oxide layer formed on grinding wheel during ELID grinding heavily influences the surface roughness of the workpiece. To study the microscopic structure of the oxide layer and model the thickness of it, we conducted a previously reported study on metallic-bonded prism samples with major adjustments and implementations. The parameter studied are voltage, electrode-grinding wheel gap, and coolant flow rate. Scanning electron microscopy (SEM) images of cross-section of the oxidation sites were captured and compared and oxide layer thickness was accurately measured. All three parameters are found to significantly affect the formation of the oxide layer.

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Funding

This research was funded by The Precision Micro Machining Center and The Instrumentation Center at the University of Toledo.

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Authors and Affiliations

  1. Precision Micro Machining Center (PMMC), The University of Toledo, 2801 W Bancroft Street, Toledo, OH, 43607, USA

    Bader Alqahtani, Miaomiao Zhang & Ioan Marinescu

  2. Mechanical Engineering Department, Northern Border University, Arar, 73222, Saudi Arabia

    Bader Alqahtani

  3. Industrial Engineering Department, Jazan University, Jazan, 45142, Saudi Arabia

    Omar T. Bafakeeh

  4. Industrial Engineering Department, Northern Border University, Arar, 73222, Saudi Arabia

    Sharaf Al Sofyani

Authors
  1. Bader Alqahtani
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  2. Miaomiao Zhang
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  3. Ioan Marinescu
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  4. Omar T. Bafakeeh
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  5. Sharaf Al Sofyani
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Correspondence to Bader Alqahtani.

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Alqahtani, B., Zhang, M., Marinescu, I. et al. Microscopic characterization and modeling of oxide layer for electrolytic in-process dressing (ELID) grinding with focus on voltage, electrode-wheel gap, and coolant flow. Int J Adv Manuf Technol 105, 4853–4862 (2019). https://doi.org/10.1007/s00170-019-03435-5

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  • DOI: https://doi.org/10.1007/s00170-019-03435-5

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