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Applying the one-column, many pencil local scanning maskless lithography technology to micro-RP system

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Abstract

This paper introduces an innovative one column, many pencil local scanning maskless lithography technology used in dynamic mask and applies it to rapid prototyping (RP) system. By using this technology in micro RP system, the resolution of the 3-D microstructures can be upgraded remarkably. In addition, some relevant experiments are conducted on this micro rapid prototyping system. In the experiment, light beam is projected onto a digital mirror device (DMD) chip [Hornbeck LJ. Digital light processing: A new MEMS-based display, 4th Sensor Symp, p. 297–304 (1996)], and the image is reflected through a micro mirror. Meanwhile, by making use of zoom lens and pins array mask (PAM), the continuing pixels can be scattered. Moreover, in order to project scattered pixels onto the resin surface, the optical system is exploited. Additionally, by using a micro-stage, it is able to control the micro X-Y movement between the scattered pixels. Furthermore, this paper makes use of the spray coating technology to improve the build up capability of the overhand structures of the traditional deep dip liquid-type RP system. Finally, combining the fore-mentioned technologies, one can produce 3-D prototypes with overhand structures in higher resolution.

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Correspondence to Jia-Chang Wang.

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Wang, JC., Hsieh, MZ. Applying the one-column, many pencil local scanning maskless lithography technology to micro-RP system. Int J Adv Manuf Technol 41, 727–733 (2009). https://doi.org/10.1007/s00170-008-1515-4

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  • DOI: https://doi.org/10.1007/s00170-008-1515-4

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