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Chromatic monitoring of downstream microwave plasma source

  • Plasma Technology
  • Published:
Czechoslovak Journal of Physics Aims and scope

Abstract

The application of the chromatic sensing for monitoring of a microwave plasma source is described. The emitted radiation from the plasma excited in the argon, oxygen and CF4 mixture was measured with three PIN-diodes with integrated optical filters. The response of the chromatic signals on variation of power and gas composition was investigated. Whereas a good sensitivity of the integrated optical signal to the power was confirmed, only a limited sensitivity to the working gas mixture was found.

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Authors and Affiliations

  1. Department of Physics, University of South Bohemia, Jeronýmova 10, 371 15, České Budějovice, Czech Republic

    M. Serý & P. Špatenka

  2. College of Education, University of J.E. Purkyně, České mládeže 8, 400 96, Ústí nad Labem, Czech Republic

    J. Pavlík

  3. Plasonic Oberflächentechnik GmbH, Carl-Zeiss-Strasse 9, D-70839, Gerlingen, Germany

    J. Messelhäuser

Authors
  1. M. Serý
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  2. P. Špatenka
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  3. J. Pavlík
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  4. J. Messelhäuser
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Serý, M., Špatenka, P., Pavlík, J. et al. Chromatic monitoring of downstream microwave plasma source. Czech. J. Phys. 50 (Suppl 3), 481 (2000). https://doi.org/10.1007/BF03165934

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  • DOI: https://doi.org/10.1007/BF03165934

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