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EPR measurement on Er-doped InP grown by organometallic vapor phase epitaxy

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Abstract

We have performed X-band ESR measurements on InP:Er epitaxial layers grown by organometallic vapor phase epitaxy, which were grown at the substrate temperatures of 530°C (sample A) and 580°C (sample B). Sample A shows a slightly anisotropic resonance aroundg = 6 with hyperfine structure due to the167Er (I = 7/2) isotope at 3 K. This result is similar to the result for Erdoped bulk InP and it indicates that Er3+ ions are located in In tetrahedral sites. On the other hand, we do not see such a resonance for sample B, suggesting that the local symmetry of Er in sample B is different from sample A. The difference between samples A and B is consistent with the fluorescence-detected extended X-ray absorption fine structure results that the coordination number of Er depends on the growth temperature.

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References

  1. Fujiwara Y., Matsubara N., Tsuchiya J., Ito T., Takeda Y.: Jpn. J. Appl. Phys.36, 6782–6787 (1997)

    Google Scholar 

  2. Masterov V.F., Shtel’makh K.F., Zakharenkov L.F.: Sov. Phys. Semicond.21, 223 (1987)

    Google Scholar 

  3. Klein P.B., Moore F.G., Dietrich H.B.: Appl. Phys. Lett.58, 502–504 (1991)

    Article  ADS  Google Scholar 

  4. Baeumler M., Schneider J., Kohl F., Tomzig E.: J. Phys. C20, L963-L965 (1987)

    Article  ADS  Google Scholar 

  5. Abragam A., Bleaney B.: Electron Paramagnetic Resonance of Transition Ions, pp. 325–335. Oxford: Clarendon Press 1970.

    Google Scholar 

  6. Lea K.R., Leask M.J.M., Wolf W.P.: J. Phys. Chem. Solids23, 1381–1405 (1962)

    Article  ADS  Google Scholar 

  7. Ofuchi H., Kawanura D., Matsubara N., Tabuchi M., Fujiwara Y., Takeda Y.: Microelectr. Eng.43–44, 745–751 (1998)

    Article  Google Scholar 

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Urakawa, C., Nakashima, Y., Ohta, H. et al. EPR measurement on Er-doped InP grown by organometallic vapor phase epitaxy. Appl. Magn. Reson. 19, 3–7 (2000). https://doi.org/10.1007/BF03162256

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  • DOI: https://doi.org/10.1007/BF03162256

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