Abstract
The fundamental study and the technological research undertaken towards the development of a micromechanical rate sensor are presented. Two interconnected aspects: the scientific development activities and the investigation into a new technology are referred to, and some points of interest are highlighted. Among them: machining accuracy problems, the nonlinearity of electrostatic actuation and the optical sensing method of displacements. These points from the type and concepts of the proposed devices. Finally, some early results of interest from simulations of one prototype, are presented and discussed.
The work is done in cooperation with staff and graduate students from the faculties of: E. E & M. E. in the, Technion (Israel Institute of Technology).
Zusammenfassung
In diesem Beitrag werden die grundsätzlichen Untersuchungen und technologischen Forschungen bei der Entwicklung mikromechanischer Geschwindigkeits-Sensoren dargelegt. Zwei eng miteinander verbundene Aspekte sind dabei: die wissenschaftlichen Entwicklungsaktivitäten und die Untersuchung einer neuen Technologie. Weiters werden speziell hervorgehoben: Probleme der Bearbeitungsgenauigkeit, die Nichtlinearität elektrostatischer Stellbewegungen und die optische Erfassung. von Verlagerungen. Diese Punkte bilden die Basis der Konzepte vorgeschlagener Sensor-Typen. Schließlich werden erste Ergebnisse der Simulation eines Prototyps dargestellt und eingehend diskutiert.
Die beschriebenen Forschungsarbeiten erfolgten in Zusammenarbeit mit Wissenschaftern und Diplomstudenten der Fakultäten Elektrotechnik und Maschinenbau am Technion Haifa (Israelisches Institut für Technologie).
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Nach einem Vortrag, gehalten anläßlich des am 26. November 1997 an der Technischen Universität Wien veranstalteten 4. Internationalen Kolloquiums „Mikro und Nanotechnologie”.
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Seter, D., Kaldor, S. Micro rate sensors in CMOS technology. Elektrotech. Inftech. 115, 185–191 (1998). https://doi.org/10.1007/BF03159115
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DOI: https://doi.org/10.1007/BF03159115