Abstract
High energy product Nd2Fe14B films were grown onto Si(100) substrate by a KrF pulsed laser ablation using the targets of NdxFe90.98-xB9.02 (x=17.51~27.51). The films of the Nd2Fe14B single phase did not exhibit a preferred orientation. However, [221], [006] and [222] axes were prominent for the films grown at the substrate temperature above 680°C by using the target of Nd27.51Fe63.47B9.02. This condition provided superior magnetic properties along the out-of-plane direction of films resulting in the magnetic properties of 4πMs≅7 kG, 4πMr≅4 kG, and iHc≅1000 Oe. The deposition rate wasn’t influenced much by changing the substrate temperature (Ts), but it increased linearly by increasing the beam energy density. The beam density of 3 J/ cm2 created the optimal condition for the highest 4πMr andiH c simultaneously. The higher content of Nd induced a higher coercivity and concentration of 4πMr at the same time due to the finer grain size without a prominent change in 4πMs. The films of x=27.51 exhibited a grain size of less than 12 nm while that of x= 17.51 produced a size about 15 nm.
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Yang, C.J., Kim, S.W. Magnetic properties of ndfeb thin films grown by a pulsed laser deposition. Metals and Materials 4, 1063–1069 (1998). https://doi.org/10.1007/BF03025977
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DOI: https://doi.org/10.1007/BF03025977