Abstract
Nanoprobe-based lithography techniques have attracted tremendous interst. However, most of these techniques have the several technical problems still to be resolved such as low throughput, reproducibility, extensive processing time and tip-wear problem. We considered that a patterning process with a multi-array tip can be a solution. The purpose of this study is to build up the database in order to design a multi-array tip for patterning. In this study, the effects of tip-geometry factors (indenter shape and tip radius) and process parameters (pattern pitch and normal load) on the deformation behaviors and etching chracteristics of hard-brittle materials (Pyrex 7740 glass and silicon) were investigated by using both experiment and finite element analysis. The results of the investigation will be applied to the design of the multi-array tip for patterning.
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Youn, S.W., Kim, H.I. & Kang, C.G. A study on the effect of pattern pitch on deformation behaviors for surface patterning by using nano-indenter. J Mech Sci Technol 19, 2112–2121 (2005). https://doi.org/10.1007/BF02916506
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DOI: https://doi.org/10.1007/BF02916506