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The integrated multiscale modeling of diamond chemical vapor deposition

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Abstract

The fundamental mechanisms of diamond growth occur on the atomic scale; however, the geometry of the deposition reactor and the other operating parameters directly affect the chemical composition of the gas and the temperature at the growth surface. The properties are, in turn, controlled by both atomic- and microstructural-scale features. By developing diamond-growth models at each length scale and coupling the output of one model into the next, a comprehensive simulation scheme for diamond deposition is realized. This approach provides the missing link between chemical vapor deposition reactor design/operating conditions and the material structure/properties.

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Authors
  1. David J. Srolovitz
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  2. David S. Dandy
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  3. James E. Butler
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  4. Corbett C. Battaile
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  5. Paritosh
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Additional information

David J. Srolovitz earned his Ph.D. in materials science and engineering at the University of Pennsylvania in 1981. He is currently Edward DeMille Campbell Professor of Materials Science and Engineering and professor of applied sciences at the University of Michigan. Dr. Srolovitz is also a member of TMS.

David S. Dandy earned his Ph.D. In chemical engineering at California Institute of Technology in 1987. He is currently a professor of chemical and bloresource engineering at Colorado State University.

James E. Butler earned his Ph.D. in chemical physics at the University of Chicago in 1972. He is currently head of the Gas/Surface Dynamics Section at the Naval Research Laboratory.

Corbett C. Battaile earned his M.S. in materials science and engineering at Vanderbilt University in 1992. He is currently a graduate student and research assistant at the University of Michigan. Mr. Battaile is also a member of TMS.

Paritosh earned his B.E. In chemical engineering at the University of Roorkee, India, in 1993. He is currently a graduate student and research assistant at the University of Michigan.

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Srolovitz, D.J., Dandy, D.S., Butler, J.E. et al. The integrated multiscale modeling of diamond chemical vapor deposition. JOM 49, 42–47 (1997). https://doi.org/10.1007/BF02914350

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