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Improvement of silicon etching resolution using the confined etchant layer technique

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Chinese Science Bulletin

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Authors and Affiliations

  1. State Key Laboratory for Physical Chemistry of the Solid Surface, Department of Chemistry, Institute of Physical Chemistry, Xiamen University, 361005, Xiamen, China

    Yanbing Zu, Lei Xie, Zhaowu Tian, Zhaoxiong Xie, Jiqian Mu & Bingwei Mao

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  1. Yanbing Zu
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  2. Lei Xie
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  3. Zhaowu Tian
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  4. Zhaoxiong Xie
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  5. Jiqian Mu
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  6. Bingwei Mao
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Zu, Y., Xie, L., Tian, Z. et al. Improvement of silicon etching resolution using the confined etchant layer technique. Chin.Sci.Bull. 42, 1318–1319 (1997). https://doi.org/10.1007/BF02882770

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  • DOI: https://doi.org/10.1007/BF02882770

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