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Electrodeposition of hafnium from the aqueous bath

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Abstract

A method is described for electrodepositing181Hf from urea-oxalate aqueous bath. The optimum conditions were determined by studying the effects of current density, time of deposition and the cathode metals. More than 80% of181Hf is deposited on a nickel cathode in one hour.

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  1. Tata Institute of Fundamental Research, 400005, Bombay, India

    Arvind T. Rane

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  1. Arvind T. Rane
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Rane, A.T. Electrodeposition of hafnium from the aqueous bath. Proc. Indian Acad. Sci. (Chem. Sci.) 89, 333–336 (1980). https://doi.org/10.1007/BF02841402

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  • DOI: https://doi.org/10.1007/BF02841402

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