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The optical property of CPD prepared CdS films

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Abstract

CdS films were prepared with chemical pyrolysis deposition (CPD) at 450°C during film grouth, and these CdS films were also annealed at different temperature from 200–500°C. The optical property of the CdS films before and after annealing was investigated at different measuring temperature from 10 K to 300 K. Optical absorption spectra show that the absorption edge is towards the shorter wavelengths, and the energy band gaps deduced from the plots of (α·hν)2 vs. hv are increased when the measuring temperature is decreased. The optical behaviors of the CdS films annealed at a certain temperature seem to have the similar tendency at different measuring temperature. Based on dEex/dT curve dependent on annealing temperature, some phenomena related microstructure in CdS films could be found.

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References

  1. M V Garcia-Cuenca, J L Morenza, J L Codina. On the Hall Effect in Polycrystalline Semiconductors.J Appl. Phys., 1985, 58: 1080–1082.

    Article  CAS  Google Scholar 

  2. J Britt and C Ferekides. Thin—film CdS/CdTe Solar Cell with 15.8% Efficiency.Appl. Phys. Lett., 1993, 62: 2851–2853.

    Article  CAS  Google Scholar 

  3. I Kaur, D K Pandya, K L Chopra. Growth Kinetics and Polymorphism of Chemically Deposited CdS Films.J. Electrochem. Soc., 1980, 127: 943–948

    Article  CAS  Google Scholar 

  4. K Senthil, D Mangalaraj, Sa K Narayandass, R kesavamoorthy, G L Nreddy. Ramanscattering and XRD Analysis in Argon Ion Implanted CdS Thin Films Prepared by Vacuum Evaporation. Nucl.,Instr. Meth. B, 2001, 173: 475–482

    Article  CAS  Google Scholar 

  5. B Ullrich, H Sakai, Y Segawa. Optoelectronic Properties of Thin Film CdS Formed by Ultraviolet and Infrared Pulsed-laser Deposition.Thin Solid Films, 2001, 385: 220–223

    Article  CAS  Google Scholar 

  6. N R Pavaskar, C A Menezea, A P B Sinha. Photoconductive CdS Films by a Chemical Bath Deposition Process.J. Electrochem. Soc., 1972, 139: 2443–2446

    Google Scholar 

  7. Deokjoon Cha, Sunmi, N K Huang. Study on Electrical Properties of CdS Films Prepared by Chemical Pyrolysis Deposition.Mater. Sci. & Eng. B, 2004, 106: 63–68

    Article  Google Scholar 

  8. D Cha, K Sunmi, N K Huang, J R Liu, J X Chen. Microstructure of CdS Films Prepared with Chemical Pyrolysis Deposition.J. Infrared Millim. Waves, 2004, 23: 1–5

    Google Scholar 

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Authors and Affiliations

  1. Sichuan University, Sichuan, China

    Huang Ning-kang (Prof.)

  2. Dept. of Physics, Kun San National Univ. 68 Miryong, 573-701, Kunsan, Korea

    Deokjoon Cha & Summi Kim

Authors
  1. Deokjoon Cha
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  2. Huang Ning-kang
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  3. Summi Kim
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Additional information

Deokjoon Cha: Born in 1954.

This work was partly supported by Visiting Scholar foundation of Key Lab. In University of China

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Cha, D., Ning-kang, H. & Kim, S. The optical property of CPD prepared CdS films. J. Wuhan Univ. Technol.-Mat. Sci. Edit. 19, 1–3 (2004). https://doi.org/10.1007/BF02835046

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  • DOI: https://doi.org/10.1007/BF02835046

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