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Conceptual design of a synchrotron radiation source dedicated to X-ray lithography

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Il Nuovo Cimento A (1965-1970)

Summary

The design of a synchrotron radiation source dedicated to X-ray lithography is presented. The parameter optimization carried out is based on the lithography requirements, on the radiation spectrum and beam source sizes, and on the machine performances, such as long lifetime, absence of beam instabilities and reliable operation at design current. High-field conventional magnets are proposed for the radiation production.

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Authors and Affiliations

  1. INFN, Laboratori Nazionali di Frascati, Via E. Fermi, Frascati, Roma

    M. Bassetti, E. Bernieri, E. Burattini, A. Cattoni, V. Chimenti, C. Sanelli, S. Tazzari & F. Tazzioli

  2. Dipartimento di Energetica, Univ. «La Sapienza», Via A. Scarpa 16, 00161, Roma

    C. Mencuccini & L. Palumbo

  3. Centro di Frascati, ENEA, Via E. Fermi, Frascati, Roma

    L. Picardi

  4. Dipartimento di Scienze Fisiche, Univ. di Napoli, Mostra d’Oltremare, Pad. 20, Napoli

    R. Rinzivillo

  5. University of Science and Technology of China, Hefei, China

    Kang Shixiu

Authors
  1. M. Bassetti
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  2. E. Bernieri
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  3. E. Burattini
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  4. A. Cattoni
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  5. V. Chimenti
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  6. C. Sanelli
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  7. S. Tazzari
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  8. F. Tazzioli
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  9. C. Mencuccini
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  10. L. Palumbo
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  11. L. Picardi
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  12. R. Rinzivillo
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  13. Kang Shixiu
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Bassetti, M., Bernieri, E., Burattini, E. et al. Conceptual design of a synchrotron radiation source dedicated to X-ray lithography. Nuov Cim A 104, 1725–1733 (1991). https://doi.org/10.1007/BF02812487

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  • DOI: https://doi.org/10.1007/BF02812487

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