Abstract
Oxygen out-diffusion during cooling and heating ofin situ grown {ie685-1} (YBCO) films in low oxygen pressure used during growth by pulsed laser deposition was studied in the temperature range 700−450°C usingin situ resistance measurements. Results indicate that irrespective of the number of cooling and heating cycles seen by the films, full oxygenation of the films can be realized by the final cooling from the growth temperature in 500 torr oxygen pressure. This result has been successfully used to sequentially grow high quality YBCO films on both sides of LaAlO3 substrates. These films have been used for the fabrication of X-band microstrip resonators with superconducting ground plane.
Similar content being viewed by others
References
Cava R J, Batlogg B, Chen C H, Rietman E A, Zahurak S M and Werder D 1987Phys. Rev. B36 5719
Fiory A T, Gurvitch M, Cava R J and Espinosa G P 1987Phys. Rev. B36 7262
Foltyn S R, Muenchausen R E, Dye R C, Wu X D, Luo L, Cooke D W and Taber R C 1991Appl. Phys. Lett. 59 1374
Jorgensen J Det al 1987Phys. Rev. B36 3608
Jorgensen J D, Veal B W, Paulikas A P, Crabtree G W, Clauss H and Kwok W K 1990Phys. Rev. B42 1863
Kwok H S and Ying Q Y 1991Physica C177 122
Lancaster M J, Maclean T S M, Wu Z, Porch A, Woodall P and Alford N NcN 1992IEE Proc. H139 149
Pinto R, Pai S P, D’Souza C P, Gupta L C, Vijayaraghavan R, Kumar D and Sharon M 1992Physica C196 264
Pinto R, Apte P R, Goyal N, Gupta L C, Vijayaraghavan R, Easwar K and Sarkar B K 1993Appl. Supercond. 1 1
Takemoto J H, Jackson C M, Manasevit H M, St John D C, Burch J F, Daly K P and Simon R W 1991Appl. Phys. Lett. 58 1109
Tu K N, Tsuei C C, Park S I and Levi A 1988Phys. Rev. B38 772
Xie X M, Chen T G and Wu Z L 1989Phys. Rev. B40 4549
Yamamoto K, Lairson B M, Bravman J C and Geballe T H 1991J. Appl. Phys. 69 7189
Zahopoulos C, Sridhar S, Bautista J J, Ortiz G and Lanagan M 1991Appl. Phys. Lett. 58 977
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Pai, S.P., Pinto, R., Apte, P.R. et al. Oxygen incorporation duringin situ growth of YBCO films on both sides of substrates. Bull. Mater. Sci. 16, 685–692 (1993). https://doi.org/10.1007/BF02757663
Received:
Revised:
Issue Date:
DOI: https://doi.org/10.1007/BF02757663