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Bulletin of Materials Science

, Volume 19, Issue 6, pp 1109–1116 | Cite as

Electron beam deposition system for X-ray multilayer mirrors

  • G S Lodha
  • R V Nandedkar
  • Adu Varma
Papers Presented At The Materials Science Section Of The 82nd Indian Science Congress, Calcutta, 1995

Abstract

We have developed a multi source electron beam evaporation system toprepare high quality X-ray multilayer mirrors. The system has three electron guns mounted in an ultra high vacuum chamber. The deposition system is evacuated by a turbo molecular pump and two sputter ion pumps. A movable masking system is mounted to deposit several kinds of multilayers. First results on niobium-carbon X-ray multilayers are presented.

Keywords

Electron beam evaporation X-ray multilayer thin films ultra high vacuum XUV optics 

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Copyright information

© the Indian Academy of Sciences 1996

Authors and Affiliations

  • G S Lodha
    • 1
  • R V Nandedkar
    • 1
  • Adu Varma
    • 1
  1. 1.Centre for Advanced TechnologyIndoreIndia

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