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Development of high resolution thin film patterns on curved photocathode substrates of image tubes

  • Proceedings Of The Symposium On Thin Film Science And Technology
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Abstract

Fabrication of thin film patterns involves a sequence of photolithographic and chemical processes to define the high resolution features in thin films on the surface of the optical substrates. The substrates used in the present work were curved fused silica with radii of curvature 58 mm and 18 mm which are used as photocathode substrates for image converter and image intensifier tube devices. The resolution pattern and bar chart were successfully printed on these substrates using a secondary conformable photomask of Mylar.

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References

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Authors and Affiliations

  1. Bhabha Atomic Research Centre, 400 085, Trombay, Bombay, India

    L M Rangarajan & V R Katti

Authors
  1. L M Rangarajan
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  2. V R Katti
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Rangarajan, L.M., Katti, V.R. Development of high resolution thin film patterns on curved photocathode substrates of image tubes. Bull. Mater. Sci. 8, 333–338 (1986). https://doi.org/10.1007/BF02744141

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  • DOI: https://doi.org/10.1007/BF02744141

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