Abstract
The LPE growth of a horizontal sliding system by temperature difference method is used to grow single and multiple layers of GaAs compounds from dilute solution. The weight ratio of Si to Ga solvent is 10−4 wt%. The growth rate, surface morphology, carrier concentration and Hall mobility are studied. Relationship between the above properties and the growth temperature and temperature different (ΔT) is also discussed. In general, the present results appear quite consistent with the diffusion limited model. The growth rate can be precisely controlled. The stability of the solid-liquid interface can be obtained in the epilayer growth at a constant temperature of the system which can avoid the effect of constitutional supercooling. Under proper control, a perfect epilayer and multiple smooth layers can be obtained.
Similar content being viewed by others
References
Casey Jr H C and Panish M B 1978Heterostructure lasers, Part B (New York: Academic Press) p 109
Hsieh J J 1980Handbook on semiconductors (eds) T S Moss and S P Keller (Amsterdam, New York, Oxford: North-Holland) Vol. 2, p 418
Long S I, Ballantyne J M and Eastman L F 1974J. Cryst. Growth 26 13
Nishizawa J and Okuno Y 1978 RIEC Technical Report TR-41, April
Sze S M 1981Physics of semiconductor devices (New York: John Wiley) pp 29–33
Tiller W A 1968J. Cryst. Growth 2 69
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Wei, C.C., Su, Y.K., Chang, C.C. et al. Liquid phase epitaxy growth of GaAs: Si by temperature difference method. Bull. Mater. Sci. 8, 439–448 (1986). https://doi.org/10.1007/BF02744108
Received:
Issue Date:
DOI: https://doi.org/10.1007/BF02744108