Abstract
The technique of high pressure is utilized to study the carrier transport behaviour in doped and undoped bulk amorphous (GeSe3·5)100−x Bi x (x=0, 2, 4, 10) down to liquid nitrogen temperature to observe impurity induced modifications in amorphous semiconductors. It is observed that pressure induced effects in lightly doped (2 at % Bi) and heavily doped (x=4, 10) semiconductors are markedly different. Results are discussed in view of the incorporation behaviour of the bismuth impurity.
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Bhatia, K., Parthasarathy, G. & Gopal, E. Study of impurity induced modifications in amorphous N-type (GeSe3·5)100−x Bi x using high pressure technique. Bull. Mater. Sci. 7, 423–426 (1985). https://doi.org/10.1007/BF02744053
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DOI: https://doi.org/10.1007/BF02744053