Abbreviations
- a :
-
Decay length of the neutral-cell potential
- a :
-
i Decay length of an extra electron wave function
- a :
-
B Bohr radius
- a :
-
0 Effective Bohr radius for a hydrogenic impurity in a semiconductor
- b :
-
Equilibrium normalized probability of generation
- d :
-
Dipole length of the donor-acceptor pair
- e :
-
Electron charge with its sign
- f :
-
Frequency
- f (k,r,t) :
-
One-electron energy distribution function
- f dr:
-
Driven frequency
- h :
-
Equilibrium normalized probability of recombination
- h α:
-
Equilibrium normalized probability of recombination due toα-process
- ħ :
-
Reduced Planck constant
- j :
-
Current density
- jext :
-
External current density
- j0:
-
d.c. current density
- Δj :
-
Amplitude of a time-dependent current density
- k :
-
Electron wavevector
- k 0 :
-
Degree of compensation
- l :
-
Azhimutal quantum number
- l (E 0):
-
Auxiliary function to define S(E 0)
- l c :
-
Equilibrium mean-free path
- l m,a :
-
Momentum mean-free path for acoustic scattering
- l ε,a :
-
Energy mean free-path for acoustic scattering
- m :
-
Carrier effective mass in units of the free electron mass
- m h :
-
Heavy hole effective mass in units of the free-electron mass
- m 1 :
-
Light hole effective mass in units of the free-electron mass
- m 0 :
-
Free electron mass
- n :
-
Principal quantum number
- n :
-
Free-carrier concentration
- n i :
-
Population of thei-th level
- n α :
-
Concentration of carriers in valleyα
- p :
-
Free-hole concentration
- r :
-
Vector space
- r 0 :
-
Distance measured from the impurity centre
- s :
-
Sound velocity (longitudinal or appropriate average)
- t :
-
Time
- t ff :
-
Time spent by a carrier in the conducting band
- t sl :
-
Time spent by a carrier in the impurity states
- t tot :
-
Total time of simulation
- u :
-
Fraction of active impurities which is ionized
- u eq :
-
Equilibrium value ofu
- v :
-
Group velocity associated to the carrier kinetic energy
- v d :
-
Free-carrier drift velocity
- v rd :
-
Reduced drift velocity accounting for trapping-detrapping mechanisms
- v 0 :
-
Velocity of the carrier in the positive-energy region
- w :
-
Dimensionless squared ratio of optical-to-acoustic matrix element
- z(x):
-
Boundary contour function
- A :
-
Value of the ratio λr,op/We,ac
- A I :
-
Integrated volume ionization rate due to impact ionization from neutral impurities
- A T :
-
Integrated thermal generation rate from neutral centres
- A I,i :
-
Integrated volume impact ionization rate from thei-th impurity excited level
- A T,i :
-
Integrated thermal generation rate from thei-th impurity excited level
- A I,α :
-
Integrated ionization rate due to impact ionization from valleyα
- A 0T :
-
Integrated thermal generation rate from negatively charged donors
- A 1T :
-
Integrated thermal generation rate from dipoles
- A *I :
-
Integrated effective volume ionization rate due to impact ionization for a many-valley model
- A T,ac :
-
Integrated thermal ionizatiom rate from neutral centres due to acoustic phonons
- B :
-
Magnetic field
- B :
-
Frequency coefficient related to carrier diffusion in the negative-energy region
- B I :
-
Average square volume recombination rate due to an Auger process to positively charged donors
- B T :
-
Average volume recombination rate of free charge to charged donors
- B I,αβ :
-
Average volume recombination rate of an electron from valleyα due to collision with an electron from valleyβ
- B T,i :
-
Average volume recombination rate to thei-th impurity excited level
- B T,α :
-
Volume thermal recombination rate from valleyα
- B *I :
-
Average effective square Auger recombination rate for a many-valley semiconductor
- B eqT :
-
Average volume recombination rate at equilibrium
- B 1T :
-
Average volume recombination rate of free charge to dipoles
- B *T :
-
Integrated volume thermal recombination effective rate for a many-valley model
- D :
-
Diffusion coefficient
- D(λ):
-
Auxiliary function for calculating -σop
- D cross :
-
Diffusion coefficient associated to fluctuations in number and velocity
- D gr :
-
Diffusion coefficient associated to number fluctuations
- D tot :
-
Total diffusion coefficient
- D vf :
-
Diffusion coefficient associated to velocity fluctuations
- E c :
-
Acoustic deformation potential
- E F :
-
Energy related to the Poole-Frenkel effect
- E 0 :
-
Given value of the electron (total) energy
- E Ni :
-
Energy level for a neutral impurity
- E f0 :
-
Energy fluctuation due to the impurity potential
- E fc0 :
-
Energy fluctuation due to the impurity potential for compensated materials
- E p0 :
-
Energy of the percolation level
- E (0)I :
-
Ground-state energy in the hydrogenic model
- E (n)I :
-
n- th excited energy level of the impurity in the hydrogenic model
- E NI :
-
Binding energy of a neutral-cell potential
- E *I :
-
Experimental value of the impurity ground-state energy
- F :
-
Electric-field strength
- F α :
-
Effective electric field in valleyα
- F ac :
-
Value of the characteristic electric field limited by acoustic phonons
- F b :
-
Value of the breakdown electric field
- F m :
-
Value of the electric field corresponding to a minimum population in the cold valleys of Si
- F ph :
-
Value of the electric field correspondent to a decrease of AI (or an increase of BT)
- F s :
-
Value of the sustained electric field
- F H :
-
Hall electric field
- G :
-
Average generation rate per unit volume
- G i :
-
Average generation rate per unit volume from thei-th ionized impurity level
- G ph,α :
-
Equilibrium average value of γph,α
- I :
-
Electrical current
- I k :
-
Total collision operator
- I collk :
-
Collision operator for scattering with thermal bath and imperfections
- I eek :
-
Collision operator for e-e scattering
- I 0k :
-
Total collision operator in positive energy space
- I 0,grk :
-
Collision operator for generation and recombination processes assisted by phonons in positive energy space
- I 0,eek :
-
Collision operator for e-e interaction in positive energy space
- K :
-
Boltzmann constant
- N :
-
Number of free carriers
- dN(E0):
-
Number of carriers in the energy interval between Eo and E0 + dE0
- dN r(E0):
-
Number of carriers in the energy interval between E0 and E0 + dE0 which recombines to charged donors per unit time
- N I :
-
Number of single charged impurities
- N I :
-
Number of excited impurity levels
- N A :
-
Acceptor concentration
- N -A :
-
Charged acceptor concentration
- N c :
-
Capture centre concentration
- N C :
-
Coulomb centre concentration in the presence of dipoles and two-donor complexes
- N D :
-
Donor concentration
- N 0D :
-
Neutral donor concentration
- N +D :
-
Charged donor concentration
- N 1 :
-
Dipole concentration
- N α :
-
Concentration of recombination centres ofα type
- P :
-
Sticking function
- P ac :
-
Sticking function for acoustic phonons
- P dip :
-
Sticking function for dipoles
- P i :
-
Discrete sticking function of thei-th ionized impurity level
- P op :
-
Sticking function for optical phonons
- P N :
-
Sticking function for neutral impurities
- Q :
-
Modified sticking function
- Q′ :
-
Modified sticking function independent of carrier concentration and electric field
- R :
-
Average total recombination rate per unit volume
- R i :
-
Average total recombination rate per unit volume to thei- th ionized impurity level
- R 0 :
-
Resistance
- S(f):
-
Electric field power spectrum for driven chaos
- S(E0):
-
Dimensionless function modeling the energy dependence of thermal recombination rate
- S I :
-
Current spectral density
- S Icross :
-
Current spectral density due to fluctuations in number and velocity
- S Igr :
-
Current spectral density due to number fluctuations
- S Ivf :
-
Current spectral density due to velocity fluctuations
- T :
-
Absolute temperature
- T e :
-
Electron temperature
- U 0 :
-
Binding energy of the trap
- U(r):
-
Impurity potential energy
- U C(r):
-
Coulomb potential energy
- U d(r):
-
Electric dipole potential energy
- U F(r):
-
Coulomb potential energy in the presence of an electric field
- V :
-
Voltage
- V 0 :
-
Volume of the crystal
- W :
-
Total transition rate for scattering processes
- W ee :
-
Transition rate for e-e interaction
- W i :
-
Transition rate for thei-th scattering process
- W ac,em :
-
Acoustic phonon emission rate including transitions to impurity levels
- W e,ac :
-
Scattering rate for elastic acoustic scattering
- W op,em :
-
Optical phonon emission rate including transitions to impurity levels
- W I,ij :
-
Ionization rate between excited levelsi, j due to Auger processes
- W T,ij :
-
Transition rate between excited levelsi, j assisted by acoustic phonons
- Z :
-
Number of unit charge of the recombination centre
- β :
-
Numerical parameter describing Poole-Frenkel effect
- β :
-
Dimensionless binding energy of a neutral-cell potential
- γ :
-
Dimensionless thermal energy
- γ(E0):
-
Total generation rate
- γ F,ac :
-
Ionization rate due to acoustic phonons in the presence of an electric field
- γ ph :
-
Thermal generation rate
- γ 0ph :
-
Thermal generation rate from a neutral donor (acceptor)
- γ ph,α :
-
Thermal generation rate for the process of typeα
- γ T,ac :
-
Thermal ionization rate due to acoustic phonons
- γ 0 :
-
Ionization rate per unit energy
- ε :
-
Electron kinetic energy
- ε> :
-
Mean electron kinetic energy
- ε c :
-
Energy to detach an empty donor state from an acceptor
- η :
-
Dimensionless binding energy
- x :
-
Relative static-dielectrie constant of the material
- x 0 :
-
Vacuum permittivity
- λ:
-
Number of equivalent valleys
- λ(k):
-
Total scattering rate
- λr(E 0):
-
Total recombination rate in positive energy space
- λr + :
-
Recombination rate to a positively charged donor
- λr,i :
-
Recombination rate for thei-th process
- λr,op :
-
Recombination rate assisted by optical phonons
- λr,N :
-
Recombination rate to neutral impurities assisted by acoustic phonons
- μ :
-
Mobility
- μac :
-
Mobility limited by acoustic phonons
- ξ:
-
Dimensionless electron energy
- ρ:
-
Density of states of free electrons
- ρI :
-
Density of states of electrons including the impurity potential
- ρ0 :
-
Density of the material
- σ:
-
Generic energy dependent cross-section for capture of an electron
- σac :
-
Cross-section for capture assisted by acoustic phonons
- σdip :
-
Cross-section for capture due to a dipole centre
- σop :
-
Cross-section for capture due to optical phonons
- σI :
-
Cross-section for impact ionization
- σg :
-
Value for σI(E0) for E0 = E (0)I
- σ1 :
-
Effective cross-section for acoustic modes
- σα :
-
Cross-section for the α-th process of recombination assisted by optical and/or intervalley phonons
- σ(A) :
-
Cross-section for capture to neutral impurities assisted by acoustic phonons
- σ0 :
-
Generic differential cross-section per unit energy
- σ0,ac :
-
Differential cross-section per unit energy due to acoustic phonons
- σ0,ee :
-
Differential cross-section per unit energy for capture assisted by e-e interaction
- gs:
-
Generic (velocity average) cross-section
- gsac :
-
Average cross-section for capture assisted by acoustic phonons
- gsee :
-
Average cross-section for capture assisted by e-e interaction
- gsop :
-
Average cross-section for capture assisted by optical and/or intervalley phonons
- gsI :
-
Average cross-section for impact ionization
- σc :
-
Conductivity
- τ:
-
Transport mean free time
- τcoll :
-
Duration of a collision
- τl :
-
Lifetime
- τα,β :
-
Intervalley scattering time between valleys α, β
- τ ε :
-
Energy relaxation time
- τα * :
-
Effective intervalley scattering time from valleyα to another valley β
- τr,ac :
-
Average recombination time assisted by acoustic phonons
- ω :
-
Angular frequency
- ω0 :
-
Optical-phonon angular frequency
- ω q :
-
Generic-phonon angular frequency
References
Section 1
K. Seeger:Semiconductor Physics (Springer-Verlag, Berlin, Heidelberg, 1985).
S. M. Sze:Physics of Semiconductor Devices (Wiley, New York, N.Y., 1981).
W. Kohn:Solid State Phys.,5, 257 (1957).
F. Bassani, G. Iadonisi andB. Preziosi:Rep. Prog. Phys.,37, 1099 (1974).
J. M. Baramowski, M. Grynberg andS. Porowski: inHandbook of Semiconductors, Vol.1, edited byW. Paul (North-Holland, Amsterdam, 1982), p. 323.
V. L. Bonch-Bruevich andE. G. Landsberg:Phys. Status Solidi,29, 9 (1968) and references therein.
V. V. Mitin:Sov. Phys. Semicond.,21, 142 (1987).
V. V. Mitin andN. A. Zakhlenik:Proceedings of the XVIII ICPS, edited byO. Engstroem (World Scientific, Singapore, 1987).
V. V. Mitin:Appl. Phys. A,39, 123 (1986).
Z. S. Gribnikov andV. A. Kochelap:Sov. Phys. JETP,31, 562 (1970).
E. J. Ryder, I. N. Moss andD. A. Kleinmann:Phys. Rev.,95, 1342 (1954).
W. Schokley:Bell Syst. Techn. J.,30, 990 (1951).
E. Erlbach andJ. B. Gunn:Phys. Rev. Lett.,8, 280 (1962).
E. A. Davies:J. Phys. Chem. Solids,25, 201 (1964).
P. J. Price: inFluctuation Phenomena in Solids, edited byR. E. Burgess (Academic Press, New York, N.Y., 1965), p. 355.
E. M. Conwell:High field transport in semiconductors, inSolid State Phys., Suppl.9 (Academic Press, New York, N.Y., 1967).
L. Reggiani:Hot Electron Transport in Semiconductors, inTopics in Applied Physics, Vol.58 (Springer-Verlag, Berlin, Heidelberg, 1985).
R. S. Levitt andA. Honig:J. Phys. Chem. Solids,22, 269 (1961).
S. M. Koenig, R. D. Brown andW. Schillinger:Phys. Rev.,128, 1668 (1962).
P. Norton, T. Braggins andH. Levinstein:Phys. Rev. Lett,30, 488 (1973).
M. Asche, H. Kostial andO. G. Sarbey:Phys. Status Solidi B,91, 521 (1979).
M. Lax:Phys. Rev.,119, 1502 (1960).
R. A. Brown andS. Rodriguez:Phys. Rev.,153, 890 (1967).
V. N. Abakumov, V. I. Perel andI. N. YassieviCH:Sov. Phys. Semicond.,12, 1 (1978).
P. T. Ladsberg andA. W. Willoughby (Editors):Proceedings of the International Conference on Recombination in Semiconductors, inSolid State Electron.,21, 1275 (1978).
W. Pickin:Solid State Electron.,21, 1299 (1978).
W. Pickin:Phys. Rev. B,20, 2451 (1979).
W. Pickin:Phys. Status Solidi B,96, 617 (1979).
W. Pickin:Phys. Status Solidi B,97, 431 (1980).
C. Jacoboni andL. Reggiani:Rev. Mod. Phys.,55, 645 (1983) and references therein.
L. Reggiani, P. Lugli andV. Mitin:Appl. Phys. Lett.,51, 925 (1987).
L. Reggiani, P. Lugli andV. Mitin:Proceedings of the IX International Conference on Noise in Physical Systems, edited byC. M. Van Vliet (World Scientific, Singapore, 1987), p. 105.
L. Reggiani, P. Lugli andV. Mitin:Solid State Electron,31, 543 (1988).
L. Reggiani, P. Lugli andV. Mitin:Phys. Rev. Lett.,60, 736 (1988).
L. Reggiani, P. Lugli andV. Mitin:Proceedings of the XIX ICPS, edited byW. Zawadzki, Wrodawska Drukarnia Naukowa (Wroclaw, 1988) p. 1723.
L. Reggiani, P. Lugli andV. Mitin:Proceedings of the III International Conference on Shallow Impurities in Semiconductors, edited byB. Monemar,The Institute of Physics Conf. Ser. No. 95 (Bristol, 1989) p. 545.
L. Reggiani, L. Varani, J. C. Vaissiere, J. P. Nougier andV. Mitin: to be published inJ. Appl. Phys. (1989).
Section 2
V. N. Abakumov andI. N. Yassievich:Sov. Phys. JETP,44, 345 (1976).
V. N. Abakumov, L. N. Kreshchuk andI. N. Yassievich:Sov. Phys. Semicond.,12, 152 (1977).
V. N. Abamukov, V. I. Perel andI. N. Yassievich:Sov. Phys. JETP,45, 354 (1977).
V. N. Abakumov andZ. N. Sokolova:Sov. Phys. Semicond.,12, 962 (1979).
V. N. Abakumov:Sov. Phys. Semicond.,13, 566 (1979).
V. N. Abakumov:Sov. Phys. Semicond.,14, 510 (1980).
V. V. Akulinichev andI. N. Yassievich:Sov. Phys. Semicond.,14, 1058 (1980).
V. V. Akulinichev andI. N. Yassievich:Sov. Phys. Semicond.,16, 159 (1982).
L. P. Pitaevskii:Sov. Phys. JETP,15, 919 (1962).
D. Bimberg, H. Münzel, A. Steckenborn andJ. Christen:Phys. Rev. B,12, 7788 (1985).
A. L. Efros, B. I. Shklovskii andI. Y. Yanchev:Phys. Status Solidi B,50, 45 (1972).
Sh. M. Kogan andT. M. Lifshits:Phys. Status Solidi A,39, 11 (1977).
L. Reggiani:J. Phys. Chem. Solids,37, 293 (1976).
O. Sarbei andM. Asche:Sov. Phys. Lett. JETP,28, 625 (1978).
A. V. Gurevich andL. P. Pitaevskii:Sov. Phys. JETP,19, 870 (1964).
M. Asche, H. Kostial andO. G. Sarbei:Phys. Status Solidi B,91, 521 (1979).
G. N. Goltsman, N. G. Ptitsina andE. R. Riger:Sov. Phys. Semicond.,18, 1053 (1984).
E. M. Gershenzon, G. M. Goltsman, G. N. Ptitsina andN. G. Riger:Sov. Phys. JETP,64, 889 (1986).
D. J. Robbins andP. T. Landsberg:J. Phys. C,13, 2425 (1980).
C. Jacoboni:Proceedings of the XIII ICPS, edited byF. Fumi (Marves, Roma, 1976), p. 1195.
F. Williams:Phys. Status Solidi B,25, 493 (1962).
B. I. Shklovskii, A. L. Efros andI. Yu. Yanchev:JETP Lett.,14, 233 (1971).
S. Chandrasekhar:Rev. Mod. Phys.,15, 1 (1943).
E. M. Gershenzon, A. P. Melnikov, R. I. Rabinovich andN. A. SerebzyaKAVA:Sov. Phys. Usp.,23, 684 (1980).
E. B. Goldgur andR. I. Rabinovich:Sov. Phys. JETP,57, 643 (1983).
Yu. N. Demkov andV. N. Ovstrovskii: inMethods of Zero-Radius Potentials in Atomic Physics (Leningrad University Press, Leningrad, 1975).
A. I. Baz, Ya. B. Zeldovich andA. M. Peremolov:Scattering, Reactions, and Decay in Nonrelativistic Quantum Mechanics (Wiley, New York, N.Y., 1969).
E. M. Gershenzon, A. P. Melnikov, R. I. Rabinovich andV. B. Smirnova:Sov. Phys. Semicond.,17, 311 (1983).
Section 3
J. S. Blakemore:Semiconductor Statistics (Pergamon Press, Oxford, London, 1962);F. Reif:Fundamentals of Statistical and Thermal Physics (McGraw-Hill, New York, N.Y., 1965).
J. Frenkel:Phys. Rev.,54, 685 (1938).
G. Ottaviani, C. Canali, C. Jacoboni, A. Alberigi Quaranta andK. Zanio:J. Appl. Phys.,44, 360 (1973).
J. L. Hartke:J. Appl. Phys.,39, 4871 (1968).
V. Dalla Casa andC. Paracchini:Phys. Rev. B,34, 8967 (1986).
E. Rosencher, V. Mosser andG. Vincent:Phys. Rev. B,29, 1135 (1984).
I. Masayuki, S. Goro andK. Sousuke:J. Appl. Phys.,42, 3737 (1971).
E. Rosencher, V. Mosser andG. Vincent:Phys. Rev. B,29, 1135 (1984).
L. V. Keldysh:Sov. Phys. JETP,10, 509 (1960).
H. W. Dravin:Z. Phys.,164, 513 (1961).
A. Zylberstejn:Phys. Rev.,127, 744 (1962).
Z. S. Kachlishvili:Phys. Status Solidi B,48, 65 (1971).
V. A. Chuenkov:Sov. Phys. Semicond.,2, 292 (1968).
V. F. Bannaya, L. I. Veselova, E. M. Gershenzon andV. A. Chuenkov:Sov. Phys. Semicond.,7, 1315 (1976);10, 202 (1976).
V. A. Chuenkov:Sov. Phys. Semicond.,11, 624 (1977).
A. A. Kastalskii:Phys. Status Solidi A,15, 599 (1973).
F. A. Khan andD. P. Bhattacharya:J. Phys. C,17, 3463 (1984).
J. F. Palmier:Phys. Rev. B,12, 4557 (1972).
T. K. Pramanik andD. P. Bhattacharya:Solid State Commun.,59, 737 (1986).
A. Baldereschi:Proceedings of the XII ICPS, edited byM. H. Pilkhum (Teubner, Stuttgart, 1974), p. 345.
M. Jaros:Deep Levels in Semiconductors (Adam Hilger Ltd., Bristol, 1982).
V. V. Mitin, M. Asche andH. Kostial:Phys. Rev. B,33, 4100 (1986).
Section 4
S. V. Gantsevich, V. L. Gurevich andR. Katilius:Riv. Nuovo Cimento,2, 1 (1979).
J. J. Duderstadt andW. R. Martin:Transport Theory (Wiley, New York, N.Y., 1979).
F. A. Khan andD. P. Bhattacharya:J. Phys. C,17, 3463 (1984).
E. Schoell:Nonequilibrium Phase Transition in Semiconductors, inSpringer Series in Synergetics, Vol.35 (Springer-Verlag, Berlin, 1987).
E. Schoell:Festkoerperprobleme, inAdvances in Solid State Physics, Vol.26, edited byP. Grosse (Vieweg, Braunschweig, 1986), p. 309.
J. R. Barker andC. J. Hearn:J. Phys. C,6, 3097 (1973).
J. R. Barker andC. J. Hearn:Proceedings of the I Conference on Computational Physics, Culham Rept. CLM-CD, Vol.2 (HMSO, London, 1969), p. 34.
P. J. Price: inSemiconductors and Semimetals (Academic Press, New York, N.Y., 1979), p. 249.
L. Reggiani: inProceedings of the XV ICPS, J. Phys. Soc. Jpn. Suppl.,49, 317 (1980).
E. M. Conwell andV. F. Weisskopf:Phys. Rev.,77, 388 (1950).
A. Van der Ziel:Noise Source Characterization (Englewood Cliffs, Prentice Hall, N.J., 1970).
J. C. Vaissiere: Ph.D. Dissertation, University of Montpellier (1986), unpublished.
L. Reggiani, L. Varani, V. Mitin andC. M. Van Vliet,Phys. Rev. Lett. 63, 1094 (1989).
V. N. Abakumov:Sov. Phys. Semicond.,13, 34 (1979).
Section 5
J. Parisi, U. Rau, J. Peinke andK. M. Mayer:Z. Phys B, in print (1988).
Sheng S. Li:Solid State Electron.,21, 1109 (1978).
E. E. Godik andYa. E. Pokrovskii:Sov. Phys. Semicond.,1, 333 (1967).
C. Canali, C. Jacoboni, F. Nava, G. Ottaviani andA. Alberigi Quaranta:Phys. Rev. B,12, 2265 (1975).
V. V. Mitin:Solid State Commun.,55, 997 (1985).
H. B. Callen andT. A. Welton:Phys. Rev.,83, 34 (1951).
R. Kubo:Response, Relaxation and Fluctuations, inLectures Notes in Physics, Vol. 31, edited byJ. Ehlers, K. Hepp andH. A. Weiden Muller (Springer, Berlin, Heidelberg, 1974), p. 74.
V. Bareikis, J. Pozhela andI. Matulionis:Proceedings of the IX ICPS, edited byS. M. Ryvkin (Nauka, Leningrad, 1968), p. 760.
J. P. Nougier andM. Rolland:Phys. Rev. B,8, 5728 (1973).
J. Zimmermann, S. Bonfis, Y. Leroy andE. Constant.:Appl. Phys. Lett,30, 245 (1977).
G. Bosman andR. J. J. Zijlstra:Phys. Lett. A,71, 464 (1979).
B. Pellegrini:Phys. Rev. B,34, 5921 (1986).
P. J. Price:J. Appl. Phys.,6, 949 (1960).
W. Shockley, J. A. Copeland andR. P. James: inQuantum Theory of Atoms, Molecules and the Solid State (Academic Press, New York, N. Y., 1966), p. 537.
R. Brunetti, C. Jacoboni andL. Reggiani:J. Phys. (Paris),42, 118 (1981).
D. Gasquet, B. Azais, J. C. Vaissiere andJ. P. Nougier: inNoise in Physical Systems and 1/f Noise, edited byA. D’Amico andP. Mazzetti (North-Holland, Amsterdam, 1985), p. 231.
J. Bernamont:Ann. Phys. (Leipzig),7, 71 (1937);M. B. Weissman:Rev. Mod. Phys.,60, 537 (1988).
H. Haken:Synergetics (Springer Verlag, Berlin, Heidelberg, 1983).
K. Aoki, K. Miyame, T. Kobayashi andK. Yamamoto:Physica B,117-118, 570 (1983).
S. W. Teitsworth, R. M. Westervelt andE. E. Haller:Phys. Rev. Lett,51, 825 (1983).
S. W. Teitsworth andR. M. Westervelt:Phys. Rev. Lett.,53, 2587 (1984);56, 516 (1986).
J. Peinke, A. Muhlbach, R. P. Huebener andJ. Parisi:Phys. Lett. A,108, 407 (1985).
J. Testa, J. Perez andC. Jeffries:Phys. Rev. Lett,48, 714 (1982).
B. C. Eu:J. Chem. Phys.,80, 2123 (1984).
V. V. Mitin:Appl. Phys. A,39, 123 (1986).
E. M. Gershenzon, G. N. Goltsman, V. V. Multanovskii andN. G. Ptitsyna:Sov. Phys. JETP,50, 728 (1979).
E. Schoell:J. Phys. (Paris),42, 57 (1981).
E. Schoell:Z. Phys. B,46, 23 (1982).
E. Schoell:Physica B,134, 271 (1985).
E. Schoell:Phys. Rev. B,34, 1395 (1986).
E. Schoell:Proceedings of the XVIII ICPS, edited byO. Engstroem (World Scientific, Singapore, 1987), p. 1555.
A. L. Dubitskii, B. S. Kerner andV. V. Osipov:Sov. Phys. Solid State,28, 725 (1986).
B. S. Kerner andV. V. Osipov:Sov. Phys. Semicond.,13, 523 (1979).
V. V. Gafilchuk, B. S. Kerner andV. V. Osipov:Sov. Phys. Semicond.,15, 1261 (1981).
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Reggiani, L., Mitin, V. Recombination and ionization processes at impurity centres in hot-electron semiconductor transport. Riv. Nuovo Cim. 12, 1–90 (1989). https://doi.org/10.1007/BF02740011
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DOI: https://doi.org/10.1007/BF02740011