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Optical critical-point structures of Si: Symmetry analysis by low-field electroreflectance

Онтические структуры критических точек кремния; Анализ симметрий с помощью электроотражения при низких энергиях

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Il Nuovo Cimento B (1971-1996)

Summary

The critical-point locations in the Brillouin zone and the relations among the interband reduced masses at these points are determined for theE’ 0,E 1 andE 2 optical structures in Si. As a synthesis, theE 4–5(k) energy contours are constructed from the experimental results.

Riassunto

Si determinano le posizioni dei punti critici nella zona di Brillouin e le relazioni tra le masse ridotte interbanda in tali punti nel caso delle strutture otticheE’ 0,E 1 eE 2 nel Si. Come sintesi, si costruiscono i contorni di energieE 4–5(k) dai risultati sperimentali.

Резюме

Определяются локализация в зоне Бриллуэна и соотношение между междузонными приведенными массами для оцтических критических точекE’ 0,E 1 иE 2 в Si. Как обобщение, конструируетсяE 4–5(k) энергетический контур из экспериментальных результатов.

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Footnotes

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Kondo, K., Moritani, A. Optical critical-point structures of Si: Symmetry analysis by low-field electroreflectance. Nuov Cim B 39, 387–391 (1977). https://doi.org/10.1007/BF02725763

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  • DOI: https://doi.org/10.1007/BF02725763

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