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Effects of vacuum deposition conditions on the structure of (111) epitaxial gold films

Влияние условий вакуумного отложения на структуру (111) зпитаксиальных эолотых пленок

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Il Nuovo Cimento B (1965-1970)

Summary

A systematic analysis of the effect of some vacuum deposition conditions on the structure of (111) silver and gold epitaxial films has been carried out. For silver films deposited on mica continuity can be attained at a thickness of ∼ 1500 Å, with a substratum temperature of 275 °C and a deposition rate of 40 Å/s. Continuous gold films ∼ 250 Å thick can be deposited on these silver films: the D.P. boundary density is minimized with a substratum temperature of ∼ 300 °C and a deposition rate lower than 1 Å/s. These results show a substantial agreement with the current theories on the nucleation and growth of epitaxial films.

Riassunto

È stata effettuata un’analisi sistematica dell’effetto di alcune condizioni sperimentali sulla struttura di pellicole epitassiali (111) di oro e di argento ottenute per evaporazione sotto vuoto. Nel caso di pellicole di argento depositate su mica, la continuità viene raggiunta ad uno spessore di ∼ 1500 Å, una temperatura del substrato di 275°C ed una velocità di deposizione di 40 Å/s. Su queste pellicole di argento si possono depositare pellicole di oro continue di ∼ 250 Å di spessore: la densità dei contorni di doppia posizione è minima per una temperatura del substrato di ∼ 300 °C ed una velocità di deposizione minore di 1 Å/s. Questi risultati sono in sostanziale accordo con le attuali teorie sui meccanismi di nucleazione e crescita delle pellicole epitassiali.

Реэюме

Был проведен систематический аналиэ влияния некоторых условий вакуумного отложения на структуру (111) зпитаксиальных серебряных и эолотых пленок. Для серебряных пленок, отложенных на слюде, непрерывность может быть достигнута при толшинах ∼1500 Å, с температурой субстрата 275 °C и скоростью отложения 40 Å/сек. Непрерывные эолотые пленки, ∼250 А толшиной, могут быть выпарены на зтих серебряных пленках: реэультаты для граничных плотностей минимиэируются при температуре субстрата ∼300 °C и скорости отложения меньще, чем 1 Å/сек.

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Zignani, F., Missiroli, G.F., Desalvo, A. et al. Effects of vacuum deposition conditions on the structure of (111) epitaxial gold films. Nuovo Cimento B (1965-1970) 55, 539–556 (1968). https://doi.org/10.1007/BF02711661

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