Abstract
Water adsorption on clean and hydrogenated Si(100) surfaces was studied under ultra high vacuum conditions using surface infrared spectroscopy. The study shows that H-Si-Si-OH and SiH2 species are formed on Si(100)-(2 × 1) and Si(100)-(2 × 1)-H surfaces, respectively. The reactivity behaviour of Si(100)-(3 × 1)-H and Si(100)-(1 × 1)-H is similar, both stabilizing oxygen inserted silicon dihydrides.
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Rao, G.R. Infrared reflection absorption study of water interaction with H-terminated Si(100) surfaces. Bull Mater Sci 27, 497–500 (2004). https://doi.org/10.1007/BF02707275
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DOI: https://doi.org/10.1007/BF02707275