Abstract
The purpose of this article is to demonstrate the applicability of microreactors for use in catalytic reactions at elevated temperatures. Microchannels were fabricated on both sides of a silicon wafer by wet chemical etching after pattern transfer using a negative photoresist. The walls of the reactor channel were coated with a platinum layer, for use as a sample catalyst, by sputtering. A heating element was installed in the channel on the opposite surface of the reactor channel. The reactor channel was sealed gas-tight with a glass plate by using an anodic bonding technique. A small-scale palladium membrane was also prepared on the surface of a 50-Μm thick copper film. In the membrane preparation, a negative photoresist was spin-coated and solidified to serve as a protective film. A palladium layer was then electrodeposited on the other uncovered surface. After the protective film was removed, the resist was again spin-coated on the copper surface, and a pattern of microslits was transferred by photolithography. After development, the microslits were electrolitically etched away, resulting in the formation of a palladium membrane as an assemblage of thin layers formed in the microslits. The integration of the microreactor and the membrane is currently under way.
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Kusakabe, K., Morooka, S. & Maeda, H. Development of a microchannel catalytic reactor system. Korean J. Chem. Eng. 18, 271–276 (2001). https://doi.org/10.1007/BF02699164
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DOI: https://doi.org/10.1007/BF02699164