Abstract
The electron optical column for the variable rectangular-shaped beam lithography system DJ-2 is described, with emphasis on the analysis of the optical configuration and the shaping deflection compensation. In this column the variable spot shaping is performed with a minimum number of lenses by a more reasonable optical scheme. A high-sensitivity electrostatic shaping deflector with sequential parallel-plates is implemented for high- speed spot shaping. With a precise linear and rotational approach, the spot current density, the edge resolution as well as the position of spot origin remain unchanged when the spot size varies. Experiments show that the spot current density of over 0.4 A/cm2 is obtained with a tungsten hairpin cathode, and the edge resolution is better than 0.2 μm within a 2×2 mm2 field size.
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Niankan, K. Electron optics of variable rectangular shaped beam lithography system DJ-2. J. of Electron. (China) 10, 170–180 (1993). https://doi.org/10.1007/BF02684544
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DOI: https://doi.org/10.1007/BF02684544