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X-ray interferometers as a means of super-high-precision metrology (review)

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Abstract

The review considers the present state of the art in the field of x-ray interferometry and its potential use for detecting and measuring nanometer-scale translations of microobjects. Basic physical models used for producing and investigating x-ray wave interference and moire patterns are presented.

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Institute of Electronics, National Academy of Sciences of Belarus, 22, Logoiskii Trakt, Minsk, 220841, Belarus. Translated from Zhurnal Prikladnoi Spekiroskopi, Vol. 66, No. 4, pp. 451–459, July–August, 1999.

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Il'in, V.N., Kobets, N.A. & Leshkov, S.V. X-ray interferometers as a means of super-high-precision metrology (review). J Appl Spectrosc 66, 481–492 (1999). https://doi.org/10.1007/BF02675374

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  • DOI: https://doi.org/10.1007/BF02675374

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