Abstract
Microcrystalline and amorphous Si:H films have been produced in a dc cathodic discharge in atmospheres containing silane diluted in hydrogen. The composition of the discharge atmosphere has a strong effect on the nucleation of microcrystalline Si:H films. Dopants such as boron enhance the formation of microcrystals while higher silanes such as disilane inhibit crystallization. The presence of other gases in the discharge atmosphere generally inhibits the formation of microcrystals.
Similar content being viewed by others
References
A. Matsuda, S. Yamasaki, K. Nakagawa, H. Okushi, K. Tanaka, S. Iizima, M. Matsumura, and H. Yamamoto, Japan J.Appl.Phys.19, L305 (1980).
S. Usui and M. Kikuchi, J.Non-Cryst. Solids34, 1 (1979).
Y. Nagata, A. Kunioka, and S. Yamazaki, Appl.Phys.-Lett.38, 142 (1981).
S. Veprek, Z. Iqbal, H. R. Oswald, and A. P. Webb, J.Phys.C: Solid State14, 295 (1981).
B. Chapman, “Glow Discharge Processes: Sputtering and Plasma Etching,” Wiley, N.Y. c.1980.
D. E. Carlson and C. W. Magee, 2nd E. C. Photovoltaic Solar Energy Conf., Berlin, 23–26 April, 1979. De Reidel Publ. Co., Dordrecht, Holland.
D. E. Carlson, R. W. Smith, C. W. Magee and P. J. Zanzucchi, Philos. Mag.B45, 51 (1982).
V. L. Dalai, M. Fortmann, and E. Eser, “Tetrahedrally Bonded Amorphous Semiconductors,” Editors, R. A. Street, D. K. Biegelsen and J. C. Knights, AIP, N.Y. 1981, p. 15.
G. A. Swartz and J. T. McGinn, private communication.
Y. Mishima, T. Hamasaki, H. Kurata, M. Hirose and Y. Osaka, Jap. J.Appl.Phys.20, L121 (1981).
S. Yamasaki, T. Hata, T. Yoshida, H. Oheda, A. Matsuda, H. Okushi and K. Tanaka, 9th Int’l. Conf. on Amorphous and Liquid Semicond., Grenoble, France, July 2–8, 1981.
S. Matsuda, M. Matsumura, K. Nakagawa, T. Imura, H. Yamamoto, S. Yamasaki, H. Okushi, L. Iizima and K. Tanaka, “Tetrahedrally Bonded Amorphous Semiconductors,” Editors, R. A. Street, D. K. Biegelsen and J. C. Knights, AIP, NY 1981.
Author information
Authors and Affiliations
Additional information
Research reported herein was supported by Solar Energy Research Institute, under Contract No. XG-0-9372-1, and by RCA Laboratories, Princeton, NJ, 08540, U.S.A.
Rights and permissions
About this article
Cite this article
Carlson, D.E., Smith, R.W. An investigation of microcrystalline films produced by a dc glow discharge in silane and hydrogen. J. Electron. Mater. 11, 749–760 (1982). https://doi.org/10.1007/BF02672393
Received:
Issue Date:
DOI: https://doi.org/10.1007/BF02672393