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An investigation of microcrystalline films produced by a dc glow discharge in silane and hydrogen

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Abstract

Microcrystalline and amorphous Si:H films have been produced in a dc cathodic discharge in atmospheres containing silane diluted in hydrogen. The composition of the discharge atmosphere has a strong effect on the nucleation of microcrystalline Si:H films. Dopants such as boron enhance the formation of microcrystals while higher silanes such as disilane inhibit crystallization. The presence of other gases in the discharge atmosphere generally inhibits the formation of microcrystals.

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Research reported herein was supported by Solar Energy Research Institute, under Contract No. XG-0-9372-1, and by RCA Laboratories, Princeton, NJ, 08540, U.S.A.

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Carlson, D.E., Smith, R.W. An investigation of microcrystalline films produced by a dc glow discharge in silane and hydrogen. J. Electron. Mater. 11, 749–760 (1982). https://doi.org/10.1007/BF02672393

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  • DOI: https://doi.org/10.1007/BF02672393

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