Abstract
The kinetics of grain growth in thin copper films during magnetically enhanced (ME) plasma processing is monitored. Transmission electron microscopy (TEM) results suggest microstructural evolution characteristic of abnormal grain growth in these films. The kinetics of abnormal grain growth appears to depend on gas pressure in the reactor.
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Naeem, M.D., Leary, H.J. & Rajan, K. Abnormal grain growth in copper films during magnetically enhanced plasma processing. J. Electron. Mater. 21, 1087–1091 (1992). https://doi.org/10.1007/BF02667598
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DOI: https://doi.org/10.1007/BF02667598