Abstract
Solid state intermetallic compound layer growth was examined following ther-mal aging of the 58Bi-42Sn/Cu couple for a temperature range of 55 to 120°C and time periods of from 1 to 400 days. The intermetallic compound layer was comprised of sublayers that included the traditional Cu6Sn5 stoichiometry as well as one or more complex Cu-Sn-Bi chemistries. The number of sublayers increased with aging temperature and time. Time-dependent layer thickness computations based upon the empirical expression, Atn + B, revealed a time exponent, n, that decreased with increasing temperature from a maximum of 0.551 at 70°C to 0.417 at 120°C. The apparent activation energy for growth (at 100 days) was 55± 7 kJ/mol. The Bi-Sn/Cu data, together with that from the other solder/copper systems, suggested that at a given homologous temperature, the quantity of Sn in the solder field determines the intermetallic compound layer thickness as a function of time.
Similar content being viewed by others
References
T. Massalski, ed.Binary Alloy Phase Diagrams (Materials Park, OH; ASM Inter., 1986), p. 540.
P. Vianco et al.,J. Electron. Mater. 23, 721 (1994).
P. Vianco et al.,J. Electron. Mater, 3 583 (1994).
A. Sunwoo et al.,Met. Trans. A 23A, 1323 (1992).
K. Tu and R. Thompson,Ada Metall. 30, 947 (1982).
D. Unsworth and C. Mackay,Trans. Inst. of Metal Finishing 51, 85 (1973).
T. Massalski, ed.Binary Alloy Phase Diagrams (Materials Park, OH; ASM Inter., 1986), pp. 498, 965.
W. Tomlinson and I. Collier,J. Mater. Sci. 22, 1835 (1987).
P. Shewmon,Transformations in Metals (New York: McGraw- Hill, 1969), p. 45.
J. Wheeler and F. Winslow,Diffusion in Body-Centered Cubic Metal (Materials Park, OH: ASM, Inter., 1965), p. 3.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Vianco, P.T., Kilgo, A.C. & Grant, R. Intermetallic compound layer growth by solid state reactions between 58Bi-42Sn solder and copper. J. Electron. Mater. 24, 1493–1505 (1995). https://doi.org/10.1007/BF02655468
Received:
Issue Date:
DOI: https://doi.org/10.1007/BF02655468