Abstract
A rigorous formulation of capacitance changes during trap filling processes is presented and used to accurately determine the electron capture cross section of EL2 in GaAs at a particular temperature, 377K, in this case. The value, σn (377K) = 2.7 × 10−16 cm2, is compared with that predicted from the emission dependence.
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D.V. Lang,J. Appl. Phys. 45, 3023 (1974).
D.C. Look and J.R. Sizelove,J. Appl. Phys. 78, 2848 (1995).
See, e.g., D.C. Look,Electrical Characterization of GaAs Materials Devices (New York: Wiley, 1989) Ch. 4.
Y. Zohta and M.O. Watanabe,J. Appl. Phys. 53, 1809 (1982).
W.M. Duncan and G.H. Westphal,GaAs and Related Compounds, 1986 IOP Conf. Ser. No. 83, ed. by W.T. Lindley (Bristol, IOP, 1987) p. 39.
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Look, D.C., Fang, Z.Q. & Sizelove, J.R. Accurate measurement of capture cross sections in deep level transient spectroscopy: Application to EL2 in GaAs. J. Electron. Mater. 24, 1461–1464 (1995). https://doi.org/10.1007/BF02655464
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DOI: https://doi.org/10.1007/BF02655464