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P-Type doping with arsenic in (211)B HgCdTe grown by MBE

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Abstract

Arsenic incorporation and doping in HgCdTe layers grown by molecular beam epitaxy (MBE) were examined in this paper. Arsenic incorporation into MBE-HgCdTe was carried out in two different ways: (1)ex-situ arsenic ion-implantation on indium-doped n-type HgCdTe layers, and (2) through a new approach called arsenic planar doping. We report onex-situ arsenic diffusion on indiumdoped MBE-HgCdTe layers at 450°C. In the investigated layers, arsenic redistribution occurs with a multi-component character. We obtained a diffusion coefficient of DAs = (1-3) × 10−13 cm2/s at 450°C. Results of differential Hall and fabricated p-n junctions suggest that during high temperature annealing, arsenic preferentially substitutes into Te sublattices and acts as acceptor impurities. In the second case, arsenic has been successfully incorporated during the MBE growth as an acceptor in the planar doping approach. Withoutex-situ annealing, as-grown layers show up to 50% activation of arsenic during the growth. These results are very promising forin-situ fabrication of infrared devices using HgCdTe material.

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Authors and Affiliations

  1. Microphysics Laboratory, Department of Physics (M/C 273), University of Illinois at Chicago, 845 W. Taylor St., Room #2236, 60680, Chicago, IL

    P. S. Wijewarnasuriya, S. S. Yoo, J. P. Faurie & S. Sivananthan

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  1. P. S. Wijewarnasuriya
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  2. S. S. Yoo
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  3. J. P. Faurie
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  4. S. Sivananthan
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Wijewarnasuriya, P.S., Yoo, S.S., Faurie, J.P. et al. P-Type doping with arsenic in (211)B HgCdTe grown by MBE. J. Electron. Mater. 25, 1300–1305 (1996). https://doi.org/10.1007/BF02655023

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  • DOI: https://doi.org/10.1007/BF02655023

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