Abstract
Conditions for growth of GaAsQ1−x Sb1−x layers with x as high as 0.7 on GaAs substrates are described for temperatures between 580 and 650°C. Effects of substrate orientation on growth characteristics are noted, and comparisons of growth on (511)- and (100)-GaAs faces are made. The experimental results indicate growth is being controlled by surface reaction kinetics. A simple model based on kinetic control is presented and at least qualitatively explains the results.
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Bedair, S.M., Timmons, M.L., Chiang, P.K. et al. Growth of GaAs1−x Sbx by organometallic vapor phase epitaxy. J. Electron. Mater. 12, 959–972 (1983). https://doi.org/10.1007/BF02654967
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DOI: https://doi.org/10.1007/BF02654967