Abstract
The effects of induced disorder on the layered structure and luminescence properties of AlxGa1-xAs quantum-well heterostructures (QWH’s) grown at Ts = 750°C by metalorganic chemical vapor deposition (MO-CVD) are investigated. High-temperature thermal anneals in the range 1000–800°C > Ts result in the interdiffusion of Al and Ga and disordering of the QWH active region. Similar results are obtained at the much lower temperature 500–600°C < T8 by impurity (Zn) diffusion, which greatly enhances the Al-Ga interdiffusion process. It is also possible, by the use of a Si3N4 surface mask, to disorder selectively only certain portions of a QWH, thus leaving unchanged the as-grown quantum-well layered structure in the remaining areas. Lower-bandgap QWH’s can be dis ordered and changed into higher-bandgap material, including from direct gap to indirect gap
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Laidig, W.D., Holonyak, N., Coleman, J.J. et al. Induced disorder of AlAs-AlGaAs-GaAs quantum-well heterostructures. J. Electron. Mater. 11, 1–20 (1982). https://doi.org/10.1007/BF02654605
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DOI: https://doi.org/10.1007/BF02654605