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Lattice and grain-boundary diffusion of phosphorus in commercially-pure copper

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Abstract

The diffusion rates of phosphorus in 3 batches of commercially-pure copper with different impurity content have been determined in the temperature range 574 to 1046° using the tracer-sectioning technique. There is clear evidence of grain-boundary diffusion occurring below 720°. The three activation energies and preexponential factors obtained for volume diffusion areQ l = 1.43 eV, 1.44 eV, 1.43 eV;Dqi = 7.02 × 10-3 cmVs, 7.98 x 10-3 cm2/s, 4.38 × 10-3 cm2/s. For grain-boundary diffusion the respective average values are Qb = 0.70 eV and Dobδ≈ 4.2× 10-7 cm3/s.

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Authors and Affiliations

  1. Research Laboratories, Siemens AG, Munich, Germany

    P. Spindler (Staff Physicist) & K. Nachtrieb (Technical Staff Member)

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  1. P. Spindler
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  2. K. Nachtrieb
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Spindler, P., Nachtrieb, K. Lattice and grain-boundary diffusion of phosphorus in commercially-pure copper. Metall Trans A 9, 763–767 (1978). https://doi.org/10.1007/BF02649785

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