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Surface nitridation of titanium metal by means of a gas tunnel type plasma jet

  • Thermal and Mechanical Processing
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Abstract

The surface nitridation of titanium was carried out at a low pressure in nitrogen atmosphere using a gas tunnel type plasma jet. The titanium nitride (TiN) film, 10 µm thick and 2000 HV, could be formed in 10 s. The structure of the TiN film was investigated by XRD. The Vickers hardness on the surface of the film was measured. The effects of deposition conditions on the properties of TiN films (TiN thickness,Vickers hardness, etc.) were investigated, and the advantage of this deposition method was identified from those results.

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Authors and Affiliations

  1. Welding Research Institute, Osaka University, 567, Ibaraki, Osaka, Japan

    A. Kobayashi

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  1. A. Kobayashi
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Kobayashi, A. Surface nitridation of titanium metal by means of a gas tunnel type plasma jet. JMEP 5, 373–380 (1996). https://doi.org/10.1007/BF02649339

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  • DOI: https://doi.org/10.1007/BF02649339

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