References
C. Matano:Jap. J. Phys., 1934, vol. 9, p. 41.
A. Ikushima:Jap. J. Phys., 1959, vol. 14, p. 111.
C. A. Mackliet:Phys. Rev., 1958, vol. 109, p. 1964.
G. L. Kehl:The Principle of Metallographic Laboratory Practices, p. 410, McGraw-Hill Book Company, New York, 1949.
G. Grube, E. Oestreicher, and O. Winkler:Z. Electrochem., 1939, vol. 45, p. 776.
C. Matano:Jap. J. Phys., 1933, vol. 8, p. 109.
M. A. Dayananda:Trans. TMS-AIME, 1968, vol. 242, p. 1369.
R. W. Krenzer and M. J. Pool:Trans. TMS-AIME, 1969, vol. 245, p. 91.
Author information
Authors and Affiliations
Additional information
Formerly at the School of Materials Science and Metallurgical Engineering, Purdue University, Lafayette, Ind.
This manuscript is based on a thesis submitted by J. D. WHITTENBERGER to Purdue University in partial fulfillment of the requirements of the Ph. D. degree.
Rights and permissions
About this article
Cite this article
Whittenberger, J.D., Dayananda, M.A. Diffusion studies in Cu-Mn alloys at 850°c. Metall Trans 1, 2023–2025 (1970). https://doi.org/10.1007/BF02642812
Received:
Issue Date:
DOI: https://doi.org/10.1007/BF02642812