Abstract
This paper describes the use of statistical methods as advocated by Taguchi to characterise and optimise a silicon nitride deposition process on a newly installed plasma deposition kit. By using orthogonal experimental design and analysis techniques, these methods allow a multiresponse process to be optimised with only a small number of experiments. Assessment of these experiments differs from conventional methods in that it is of first importance to minimise the variation in response. This then gives a process which is insensitive to the effects of uncontrollable factors. Using these techniques, yields of at least 99% have been obtained for the process studied.
Although this paper describes an application of the Taguchi technique to a particular process, the method is widely applicable to many other activities within the context of advanced manufacturing technology.
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Logothetis, N., Atkinson, C.J., Salmon, J.P. et al. Development of newly installed processes. Int J Adv Manuf Technol 5, 256–274 (1990). https://doi.org/10.1007/BF02601535
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DOI: https://doi.org/10.1007/BF02601535