Abstract
The discovery of superconductivity with critical temperatures of ∼100 K opens new opportunities for wide-scale application of superconducting microelectronics devices with ultraminiature elements (less than 0.1 µm). Projection x-ray lithography could serve as a technological basis of such microelectronics. It is demonstrated that application of x-ray optics elements, production of which can be readily provided by modern technological facilities, makes it possible to produce microstructures with element dimensions of the order of tens of nanometers and to eliminate to a considerable extent the drawbacks inherent in contact lithography.
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Translated from Trudy Fizicheskogo Instituta im. P. N. Lebedeva (Proceedings of the Lebedev Physical Institute, Russian Academy of Sciences, Moscow), Vol. 196, pp. 130–142, 1989.
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Zorev, N.N. Outlook for projection x-ray lithography. J Russ Laser Res 16, 551–567 (1995). https://doi.org/10.1007/BF02581036
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DOI: https://doi.org/10.1007/BF02581036