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Kinetics and mechanism of oxidation of silicon nitride bonded silicon carbide ceramic

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Abstract

Thermogravimetry (TG) has been used to study the oxidation of a commercial silicon nitride bonded silicon carbide (SNBSC) ceramic. The oxidation was studied in air and carbon dioxide atmospheres between 800 and 1300°C. TG/mass spectrometry (MS) shows that the silicon nitride bonding phase oxidises first. The kinetics follow a multi-stage mechanism with diffusion control. Carbon dioxide was found to be a more powerful oxidant than air at temperatures above 1050°C.

Zusammenfassung

Mittels Thermogravimetrie wurde die Oxidation einer handelsüblichen, siliziumnitridgebundenen Siliziumcarbidkeramik (SNBSC) untersucht. Die Oxidation wurde sowohl in Luft als auch in einer Kohlendioxidatmosphäre zwischen 800 und 1300°C untersucht. TG/MS zeigt, daß die Siliziumnitridphase als erste oxidiert wird. Die Reaktionskinetik folgt einem diffusionsbestimmten Mehrstufenmechanismus. Oberhalb 1050°C erwies sich Kohlendioxid als stärkeres Oxidationsmittel als Luft.

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Authors and Affiliations

  1. Research & Technology, Gas Research Centre, British Gas plc, Ashby Road, LE11 3QU, Loughborough, Leicestershire, UK

    M. Thorley & R. Banks

Authors
  1. M. Thorley
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  2. R. Banks
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Thorley, M., Banks, R. Kinetics and mechanism of oxidation of silicon nitride bonded silicon carbide ceramic. Journal of Thermal Analysis 42, 811–822 (1994). https://doi.org/10.1007/BF02546752

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  • DOI: https://doi.org/10.1007/BF02546752

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