Abstract
Several microanalytical problems arising in the study of the manufacture of a planar bipolar transistor are solved using the techniques of nuclear reactions and secondary ionic emission analysis. The results obtained permit a comparison of the possibilities of the two methods.
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Monnier, J., Hilleret, H., Ligeon, E. et al. The use of secondary ionic emission and nuclear reactions to determine the parameters in the manufacture of a planar transistor. J. Radioanal. Chem. 12, 353–366 (1972). https://doi.org/10.1007/BF02521001
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DOI: https://doi.org/10.1007/BF02521001