Skip to main content
Log in

Neutron activation analysis of semiconductor silicon

  • Material Sciences and Industrial Applications
  • Published:
Journal of Radioanalytical Chemistry Aims and scope Submit manuscript

Abstract

The determination of impurities in semiconductor silicon by nondestructive and destructive NAA is described. To improve the detection limit, a multiple beta—single gamma detector assembly is used. It is shown that24Na is also produced from silicon by a (n, αp) reaction with reactor neutrons. The cross-section with fission neutrons is 1.8·10−9 barn.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Similar content being viewed by others

References

  1. S. NIESE, Kernenergie, 7 (1964) 105.

    CAS  Google Scholar 

  2. G. AUBOIN, J. DIEBOLT, E. JUNOD, J. LAVERLOCHERE, Intern. Conf. Modern Trends in Activation Analysis, 1965.

  3. I. RUZICKA, I. STARY, Atomic Energy Rev., 2 (1964) 3.

    CAS  Google Scholar 

  4. M. KAHLENBACH, W. GÖRNER, G. LOOS, J. Radioanal. Chem., 28 (1975) 263.

    CAS  Google Scholar 

  5. W. HELBIG, Isotopenpraxis, (in the press).

  6. S. NIESE, W. GÖRNER, H. KLEEBERG, Nucl. Instr. Methods, 118 (1974) 217.

    Article  CAS  Google Scholar 

  7. S. NIESE, J. Radioanal. Chem., 15 (1973) 567.

    Article  CAS  Google Scholar 

  8. S. NIESE, H. KLEEBERG, Isotopenpraxis, 11 (1975) 125.

    CAS  Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Rights and permissions

Reprints and permissions

About this article

Cite this article

Niese, S. Neutron activation analysis of semiconductor silicon. J. Radioanal. Chem. 38, 37–41 (1977). https://doi.org/10.1007/BF02520181

Download citation

  • Received:

  • Issue Date:

  • DOI: https://doi.org/10.1007/BF02520181

Keywords

Navigation