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A chemical reactor for the spray deposition of thin SnO2 films

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Il Nuovo Cimento C

Summary

A chemical reactor for the deposition of thin SnO2 films with the spray technique is described. The thermodynamical conditions inside the reactor have been studied in order to evaluate the critical parameters of the process.

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References

  1. F. Simonis, M. Van der Leij andC. J. Hoogendoorn:Sol. Energy Mater.,1, 221 (1979).

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  2. C. Bellecci, M. Camarca, M. Conti, L. La Rotonda, G. Piccini andR. Visentin:Nuovo Cimento C, in press.

  3. J. L. Vossen:Phys. of Thin Films,9, 1 (1977).

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  4. J. C. Viguiè:Chemical vapour deposition from an aerosol, inScience and Technology of Surface Coating, edited byB. N. Chapman andJ. C. Anderson (London, 1974).

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Authors and Affiliations

  1. Università della Calabria, C.I.R.A.E.S., Rende (CS), Italia

    C. Bellecci, A. Bonanno, M. Camarca, M. Conti, L. La Rotonda, G. Piccini & R. Visentin

Authors
  1. C. Bellecci
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  2. A. Bonanno
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  3. M. Camarca
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  4. M. Conti
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  5. L. La Rotonda
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  6. G. Piccini
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  7. R. Visentin
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Additional information

This work has been performed in the framework of activities of the «Progetto Finalizzato Energetica» supported by the C.N.R.

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Bellecci, C., Bonanno, A., Camarca, M. et al. A chemical reactor for the spray deposition of thin SnO2 films. Il Nuovo Cimento C 5, 374–382 (1982). https://doi.org/10.1007/BF02509146

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  • DOI: https://doi.org/10.1007/BF02509146

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