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Increasing the accuracy of diffractometric measurement of microrelief in integrated circuits

  • General Topics of Metrology and Measuring Technique
  • Published:
Measurement Techniques Aims and scope

Abstract

We present a method for reducing error in diffractometric measurement of the dimensions of components of integrated circuits by reducing the systematic error introduced by the descriptive medel of the object of measurement.

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Authors
  1. N. N. Beklemishev
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  2. S. B. Benevolenskii
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  3. I. L. Istomina
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  4. P. V. Kopylov
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Additional information

Translated from Izmeritel'naya Tekhnika, No. 3, pp. 13–14, March, 1998.

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Beklemishev, N.N., Benevolenskii, S.B., Istomina, I.L. et al. Increasing the accuracy of diffractometric measurement of microrelief in integrated circuits. Meas Tech 41, 207–209 (1998). https://doi.org/10.1007/BF02503884

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  • DOI: https://doi.org/10.1007/BF02503884

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