Abstract
A development of the activation-drift model is obtained. This enables the procedure for determining the parameters of deep levels in semiconductors using the data of nonstationary spectroscopy and low-frequency noise spectroscopy to be made more accurate and increases the reproducibility and reliability of the results of measurements.
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Translated from Izmeritel'naya Tekhnika, No. 12, pp. 44–46, December, 1998.
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Kholomina, T.A. Determination of the parameters of deep levels in semiconductors using nonstationary spectroscopy and low-frequency noise spectroscopy. Meas Tech 41, 1157–1161 (1998). https://doi.org/10.1007/BF02503838
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DOI: https://doi.org/10.1007/BF02503838