Abstract
The titanium nitride coating film was prepared on the SiO2 glass substrate by ammonolysis of titanium dioxide coating film formed by sol-gel method. The X-ray diffraction (XRD) pattern indicated that it is cubic titanium nitride with a lattice parameter,a o, of 0.4231 nm. The obtained titanium nitride is non-stoichiometric (TiN x x≤ 1) because the value, 0.4231 nm, is smaller than the stoichiometric one (0.4240 nm). The coating film show very high infrared (i.r.) reflectance in the wavelength region of 2–8 μm.
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